Development of a Microspot Spectroscopic Ellipsometer Compatible with Atomic Force Microscope |
In, Sun Ja
(Ellipso Technology Co. Ltd.)
Lee, Min Ho (Ellipso Technology Co. Ltd.) Cho, Sung Yong (Ellipso Technology Co. Ltd.) Hong, Jun Seon (Ellipso Technology Co. Ltd.) Baek, In Ho (Ellipso Technology Co. Ltd.) Kwon, Yong Hyun (Ellipso Technology Co. Ltd.) Yoon, Hee Kyu (Ellipso Technology Co. Ltd.) Kim, Sang Youl (Ellipso Technology Co. Ltd.) |
1 | J. Lee, P. I. Rovira, I. An, and R. W. Collins, "Rotating-compensator multichannel ellipsometry: Applications for real time Stokes vector spectroscopy of thin film growth," Rev. Sci. Instrum. 69, 1800-1810 (1998). DOI |
2 | I. An, J. A. Zapien, C. Chen, A. S. Ferlauto, A. S. Lawrence, and R. W. Collins, "Calibration and data reduction for a UV-extended rotating-compensator multichannel ellipsometer," Thin Solid Films 455-456, 132-137 (2004). DOI |
3 | T. Mori and D. E. Aspnes, "Comparison of the capabilities of rotating-analyzer and rotating-compensator ellipsometers by measurements on a single system," Thin Solid Films 455-456, 33-38 (2004). DOI |
4 | S. Y. Cho, S. J. Kim, M. H. Lee, and S. Y. Kim, "편광자 연속회전 광량측정법과 Incomplete Fourier Transformation을 적용한 실시간 분광타원계의 개발," in Proc. OSK Annual Meeting (Hoengseong, Korea, Feb. 20-22, 2019), paper F1A-II-1. |
5 | R. M. A. Azzam and N. M. Bashara, Ellipsometry and Polarized Light, 1st ed. (North-Holland Publishing, Amsterdam, Netherlands, 1987). |
6 | S. Y. Kim, Ellipsometry (Ajou University, Suwon, Korea, 2000). |
7 | H. Fujiwara, Spectroscopic Ellipsometry: Principles and Applications (John Wiley & Sons, Japan, 2007). |
8 | K. Vedam, P. J. McMarr, and J. Narayan, "Nondestructive depth profiling by spectroscopic ellipsometry," Appl. Phys. Lett. 47, 339-341 (1985). DOI |
9 | S. Y. Kim and K. Vedam, "Simultaneous determination of dispersion relation and depth profile of thorium fluoride thin film by spectroscopic ellipsometry," Thin Solid Films 166, 325-334 (1988). DOI |
10 | C.-S. Jun, "차세대 반도체 device 개발과 생산을 위한 측정 검사 기술," in Proc. 2019 Next Generation Lithography Conference (Incheon, Korea, Aug. 21-23, 2019). |
11 | S. J. Kim, H. K. Yoon, M. H. Lee, S. J. In, S. Y. Cho, Y. H. Kwon, B. K. Kim, D. H. Bae, J. H. Shin, and S. Y. Kim, "Development and evaluation of micro spot spectroscopic ellipsometer," in Proc. 8th International Conference on Spectroscopic Ellipsometry (Barcelona, Spain, May 26-31, 2019) p. 152. |
12 | S. J. Kim, M. H. Lee, and S. Y. Kim, "Development of a microspot spectroscopic ellipsometer using reflective objectives, and the ellipsometric characterization of monolayer MoS2," Curr. Opt. Photonics 4, 353-360 (2020). |
13 | J. Opsal, J. Fanton, J. Chen, J. Leng, L. Wei, C. Uhrich, M. Senko, C. Zaiser, and D. E. Aspnes, "Broadband spectral operation of a rotating-compensator ellipsometer," Thin Solid Films 313-314, 58-61 (1998). DOI |
14 | S. Y. Kim, "Design of a free-form Mueller matrix ellipsometer with imperfect compensators," Korean J. Opt. Photon. 33, 59-66 (2022). |
15 | E. W. Mueller, "Field Emission Microscopy," in Physical Methods in Chemical Analysis, W. G. Berl, Ed. (Academic Press Inc., NY, USA, 1956), Vol. 3, pp. 135-181. |
16 | J. Narayan, S. Y. Kim, K. Vedam, and R. Manukonda, "Formation and nondestructive characterization of ion implanted silicon-on-insulator layers," Appl. Phys. Lett. 51, 343-345 (1987). DOI |
17 | C. Wang, X. Chen, C. Chen, S. Sheng, L. Song, H. Gu, H. Jiang, C. Zhang, and S. Liu, "Reconstruction of finite deep subwavelength nanostructures by Mueller-matrix scattered-field microscopy," Opt. Express 29, 32158-32168 (2021). DOI |