Browse > Article
http://dx.doi.org/10.3807/KJOP.2022.33.5.201

Development of a Microspot Spectroscopic Ellipsometer Compatible with Atomic Force Microscope  

In, Sun Ja (Ellipso Technology Co. Ltd.)
Lee, Min Ho (Ellipso Technology Co. Ltd.)
Cho, Sung Yong (Ellipso Technology Co. Ltd.)
Hong, Jun Seon (Ellipso Technology Co. Ltd.)
Baek, In Ho (Ellipso Technology Co. Ltd.)
Kwon, Yong Hyun (Ellipso Technology Co. Ltd.)
Yoon, Hee Kyu (Ellipso Technology Co. Ltd.)
Kim, Sang Youl (Ellipso Technology Co. Ltd.)
Publication Information
Korean Journal of Optics and Photonics / v.33, no.5, 2022 , pp. 201-209 More about this Journal
Abstract
The previously developed microspot spectroscopic ellipsometer (SE) is upgraded to a microspot SE compatible with the atomic force microscope (AFM). The focusing optical system of the previous microspot SE is optimized to incorporate an AFM head. In addition, the rotating compensator ellipsometer in polarizer-sample-compensator-analyzer configuration is adopted in order to minimize the negative effects caused by beam wobble. This research leads to the derivation of the expressions needed to get spectro-ellipsometric constants despite the fact that the employed rotating compensator is far from the ideal achromatic quarter-wave plate. The spot size of the developed microspot SE is less than 20 ㎛ while the AFM head is mounted. It operates in the wavelength range of 190-850 nm and has a measurement accuracy of δΔ ≤ 0.05° and δΨ ≤ 0.02°, respectively. Fast measurement of ≤3 s/sp is realized by precisely synchronizing the azimuthal angle of a rotating compensator with the spectrograph. The microspot SE integrated with an AFM is expected to be useful in characterizing the structure and optical properties of finely patterned samples.
Keywords
Atomic force microscope; Microspot spectroscopic ellipsometer;
Citations & Related Records
연도 인용수 순위
  • Reference
1 J. Lee, P. I. Rovira, I. An, and R. W. Collins, "Rotating-compensator multichannel ellipsometry: Applications for real time Stokes vector spectroscopy of thin film growth," Rev. Sci. Instrum. 69, 1800-1810 (1998).   DOI
2 I. An, J. A. Zapien, C. Chen, A. S. Ferlauto, A. S. Lawrence, and R. W. Collins, "Calibration and data reduction for a UV-extended rotating-compensator multichannel ellipsometer," Thin Solid Films 455-456, 132-137 (2004).   DOI
3 T. Mori and D. E. Aspnes, "Comparison of the capabilities of rotating-analyzer and rotating-compensator ellipsometers by measurements on a single system," Thin Solid Films 455-456, 33-38 (2004).   DOI
4 S. Y. Cho, S. J. Kim, M. H. Lee, and S. Y. Kim, "편광자 연속회전 광량측정법과 Incomplete Fourier Transformation을 적용한 실시간 분광타원계의 개발," in Proc. OSK Annual Meeting (Hoengseong, Korea, Feb. 20-22, 2019), paper F1A-II-1.
5 R. M. A. Azzam and N. M. Bashara, Ellipsometry and Polarized Light, 1st ed. (North-Holland Publishing, Amsterdam, Netherlands, 1987).
6 S. Y. Kim, Ellipsometry (Ajou University, Suwon, Korea, 2000).
7 H. Fujiwara, Spectroscopic Ellipsometry: Principles and Applications (John Wiley & Sons, Japan, 2007).
8 K. Vedam, P. J. McMarr, and J. Narayan, "Nondestructive depth profiling by spectroscopic ellipsometry," Appl. Phys. Lett. 47, 339-341 (1985).   DOI
9 S. Y. Kim and K. Vedam, "Simultaneous determination of dispersion relation and depth profile of thorium fluoride thin film by spectroscopic ellipsometry," Thin Solid Films 166, 325-334 (1988).   DOI
10 C.-S. Jun, "차세대 반도체 device 개발과 생산을 위한 측정 검사 기술," in Proc. 2019 Next Generation Lithography Conference (Incheon, Korea, Aug. 21-23, 2019).
11 S. J. Kim, H. K. Yoon, M. H. Lee, S. J. In, S. Y. Cho, Y. H. Kwon, B. K. Kim, D. H. Bae, J. H. Shin, and S. Y. Kim, "Development and evaluation of micro spot spectroscopic ellipsometer," in Proc. 8th International Conference on Spectroscopic Ellipsometry (Barcelona, Spain, May 26-31, 2019) p. 152.
12 S. J. Kim, M. H. Lee, and S. Y. Kim, "Development of a microspot spectroscopic ellipsometer using reflective objectives, and the ellipsometric characterization of monolayer MoS2," Curr. Opt. Photonics 4, 353-360 (2020).
13 J. Opsal, J. Fanton, J. Chen, J. Leng, L. Wei, C. Uhrich, M. Senko, C. Zaiser, and D. E. Aspnes, "Broadband spectral operation of a rotating-compensator ellipsometer," Thin Solid Films 313-314, 58-61 (1998).   DOI
14 S. Y. Kim, "Design of a free-form Mueller matrix ellipsometer with imperfect compensators," Korean J. Opt. Photon. 33, 59-66 (2022).
15 E. W. Mueller, "Field Emission Microscopy," in Physical Methods in Chemical Analysis, W. G. Berl, Ed. (Academic Press Inc., NY, USA, 1956), Vol. 3, pp. 135-181.
16 J. Narayan, S. Y. Kim, K. Vedam, and R. Manukonda, "Formation and nondestructive characterization of ion implanted silicon-on-insulator layers," Appl. Phys. Lett. 51, 343-345 (1987).   DOI
17 C. Wang, X. Chen, C. Chen, S. Sheng, L. Song, H. Gu, H. Jiang, C. Zhang, and S. Liu, "Reconstruction of finite deep subwavelength nanostructures by Mueller-matrix scattered-field microscopy," Opt. Express 29, 32158-32168 (2021).   DOI