1 |
J. N. Hilfiker, B. Johs, C. M. Herzinger, J. F. Elman, E. Montbach, D. Bryant, and P. J. Bos, "Generalized spectroscopic ellipsometry and Mueller-matrix study of twisted nematic and super twisted nematic liquid crystals," Thin Solid Films 455-456, 596-600 (2004).
DOI
|
2 |
G. L. Whitworth, A. Francone, C. M. Sotomayor-Torres, and N. Kehagias, "Real-time optical dimensional metrology via diffractometry for nanofabrication," Sci. Rep. 10, 5371 (2020).
DOI
|
3 |
R. M. A. Azzam and N. M. Bashara, Ellipsometry and Polarized Light (North-Holland, Amsterdam, 1987).
|
4 |
S. Y. Kim, Ellipsometry (Ajou University Press, Korea, 2000), Chapter 3-4.
|
5 |
D. E. Aspnes and A. A. Studna, "A high-precision scanning ellipsometer," Appl. Opt. 14, 220-228 (1975).
DOI
|
6 |
K. Vedam and P. J. McMarr, "Nondestructive depth profiling by spectroscopic ellipsometry," Appl. Phys. Lett. 47, 339-341 (1985).
DOI
|
7 |
K. Vedam and S. Y. Kim, "Simultaneous determination of refractive index, its dispersion and depth-profile of magnesium oxide thin film by spectroscopic ellipsometry," Appl. Opt. 28, 2691-2694 (1989).
DOI
|
8 |
T. Mori and D. E. Aspnes, "Comparison of the capabilities of rotating-analyzer and rotating-compensator ellipsometers by measurements on a single system," Thin Solid Films 455-456, 33-38 (2004).
DOI
|
9 |
K. Ebert and D. E. Aspnes, "Biplate artifacts in rotating-compensator ellipsometers," Thin Solid Films 455-456, 779-783 (2004).
DOI
|
10 |
D. E. Aspnes and A. A. Studna, "Dielectric functions and optical parameters of Si, Ge, GaP, GaAs, GaSb, InP, InAs, and InSb from 1.5 to 6.0 eV," Phys. Rev. B 27, 985 (1983).
DOI
|
11 |
M. Watanabe, S. Baba, T. Nakata, T. Morimoto, and S. Sekino, "A novel AFM method for sidewall measurement of high-aspect ratio patterns," Proc. SPIE 6922, 69220J (2008).
DOI
|
12 |
R. A. Synowicki, J. N. Hilfiker, and P. K. Whitman, "Mueller matrix ellipsometry study of uniaxial deuterated potassium dihydrogen phosphate (DKDP)," Thin Solid Films 455-456, 624-627 (2004).
DOI
|
13 |
W. Ito, B. Bunday, S. Harada, A. Cordes, T. Murakawa, A. Arceo, M. Yoshikawa, T. Hara, T. Arai, S. Shida, M. Yamagata, J. Matsumoto, and T. Nakamura, "Novel three dimensional (3D) CD-SEM profile measurements," Proc. SPIE 9050, 90500D (2014).
DOI
|
14 |
K. Harafuji, N. Nomura, and T. Kouda, "On the image brightness of the trench bottom surface in a scanning electron microscope," J. Appl. Phys. 72, 2541-2548 (1992).
DOI
|
15 |
H.-T. Huang and F. L. Terry Jr., "Erratum to 'Spectroscopic ellipsometry and reflectometry from gratings (Scatterometry) for critical dimension measurement and in situ, real-time process monitoring' [Thin Solid Films 455-456 (2004) 828-836]," Thin Solid Films 468, 339-346 (2004).
DOI
|
16 |
W. Wei, S. Hou, Z. Wu, Y. Hu, Y. Wang, L. Chen, Y. Xiong, Y. Tian, and G. Liu, "Optical detection method for high aspect ratio microstructures," Macromachines 11, 296 (2020).
DOI
|
17 |
KLA-Tencor Corporation, "Systems and methods for extended infrared spectroscopic ellipsometry," Korean Patent 20180095102A (2018).
|
18 |
KLA-Tencor Corporation, "Method and system for measuring deep trenches in silicon," US patent 7369235B1 (2008).
|
19 |
C. Chen, I. An, G. M. Ferreira, N. J. Podraza, J. A. Zapien, and R. W. Collins, "Multichannel Mueller matrix ellipsometer based on the dual rotating compensator principle," Thin Solid Films 455-456, 14-23 (2004).
DOI
|
20 |
J. Li, B. Ramanujam, and R. W. Collins, "Dual rotating compensator ellipsometry: theory and simulations," Thin Solid Films 519, 2725-2729 (2011).
DOI
|
21 |
H. Fujiwara, Spectroscopic Ellipsometry: Principles and Applications (John Wiley & Sons, Tokyo, Japan, 2007), Chapter 5.
|