Browse > Article
http://dx.doi.org/10.3807/HKH.2009.20.1.057

Enhancement of Light Guiding Efficiency in CMOS Image Sensor by Introducing an Optical Thin Film  

Kang, Myung-Hoon (Department of Nano Systems Engineering, Inje University)
Ko, Eun-Mi (Department of Nano Systems Engineering, Inje University)
Lee, Je-Won (Department of Nano Systems Engineering, Inje University)
Cho, Guan-Sik (Department of Nano Systems Engineering, Inje University)
Publication Information
Korean Journal of Optics and Photonics / v.20, no.1, 2009 , pp. 57-60 More about this Journal
Abstract
We consider introducing an optical thin film to the light guiding wall of a pixel in order to enhance the light guiding efficiency of a CMOS image sensor. Simulating the reflectance as a function of the incidence angle using the Essential Macleod program, we find that the range of total internal reflection is greatly increased for several materials. Particularly when air is chosen as the thin film material, the critical angle of total internal reflection could be shifted to about 50 degrees.
Keywords
CMOS image sensor; Optical thin films; Optical crosstalk; Reflectance;
Citations & Related Records
연도 인용수 순위
  • Reference
1 T. H. Hsu, Y. K. Fang, D. N. Yaung, S. G. Wuu, H. C. Chien, C. H. Tseng, L. L. Yao, W. D. Wang, C. S. Wang, and S. F. Chen, “A High-Efficiency CMOS Image Sensor With Air Gap in situ MicroLens (AGML) Fabricated by 0.18-${\mu}m$ CMOS Technology,” IEEE electron device letters, vol. 26, no. 9, pp. 634-636, 2005   DOI   ScienceOn
2 H. Rhodes, G. Agranov, C. Hong, U. Boettiger, R. Mauritzson, J. Ladd, I. Karasev, J. McKee, E. Jenkins, W. Quinlin, I. Patrick, J. Li, X. Fan, R. Panicacci, S. Smith, C. Mouli, and J. Bruce, “CMOS Imager Technology Shrinks and Image Performance,” 2004 IEEE Workshop on Microelectronics and Electron Devices, pp. 7-18, 2004   DOI
3 T. H. Hsu, Y. K. Fang, C. Y. Lin, S. F. Chen, C. S. Lin, D. N. Yaung, S. G. Wuu, C. H. Tseng, J. S. Lin, and C. S. Wang, “Light Guide for Pixel Crosstalk Improvement in Deep Submicron CMOS Image Sensor,” IEEE electron device letters, vol. 25, no. 1, pp. 22-24, 2004   DOI   ScienceOn
4 C. H. Koo, H. K. Kim, K. H. Paik, D. C. Park, K. H. Lee, Y. K. Park, C. R. Moon, S. H. Lee, S. H. Hwang, D. H. Lee, and J. T. Kong, “Improvement of Crosstalk on 5M CMOS Image Sensor with $1.7{\times}1.7$ $um^2$ pixels,” Proc. of SPIE, vol. 6471, pp. 647115-1-5, 2007   DOI
5 G. Agranov, V. Berezin, and R. H. Tsai, “Crosstalk and Microlens Study in a Color CMOS Image Sensor,” IEEE transaction on electron devices, vol. 50, no. 1, pp. 4-11, 2003   DOI   ScienceOn
6 D. N. Yaung, S. G. Wuu, H. C. Chien, T. H. Hsu, C. H. Tseng, J. S. Lin, J. J. Chen, C. H. Lo, C. Y. Yu, C. S. Tssi, and C. S. Wang, “Air-Gap Guard Ring for Pixel Sensitivity and Crosstalk Improvement in Deep Sub-micron CMOS Image Sensor,” IEEE IEDM, vol. 401, pp. 16.5.1-16.5.4, 2003   DOI
7 T. H. Hsu, Y. K. Fang, D. N. Yaung, S. G. Wuu, H. C. Chien, C. S. Wang, J. S. Lin, C. H. Tseng, S. F. Chen, C. S. Lin, and C. Y. Lin, “Color Mixing Improvement of CMOS Image Sensor With Air-Gap-Guard Ring in Deep-Submicrometer CMOS Technology,” IEEE electron device letters, vol. 26, no. 5, pp. 301-303, 2005   DOI   ScienceOn
8 E. R. Fossum, “CMOS Image Sensors: Electronic Camera-On-A-Chip,” IEEE transaction on electron devices, vol. 44, no.10, pp. 1689-1698, 1997   DOI   ScienceOn
9 M. Bigas, E. Cabruja, J. Forest, and J. Salvi, “Review of CMOS image sensors,” Microelectronics Journal, vol. 37, pp. 433-451, 2006   DOI   ScienceOn
10 Y. Chae, K. Choe, B. Kim, and G. Han, “Sensitivity Controllable CMOS Image Sensor Pixel Using Control Gate Overlaid on Photodiode,” Electron Device Letters. IEEE, vol. 28, Issue 6, pp. 495-498, 2007   DOI   ScienceOn
11 황보창권, 박막광학(테크 미디어, 서울, 2005)
12 김은지, “광 집적도를 향상시킨 시모스 이미지센서의 제조방법,” 대한한국 특허 10-2004-0069224, 2004
13 황충호, “금속막 마이크로렌즈를 구비한 이미지 센서,” 대한민국 특허 10-2003-0098504, 2003