Fabrication and optical characteristics of 50 ㎓ narrow band pass filter for fiber optical communication using dual ion beam sputtering technique
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김회경
(전자부품연구원 광부품연구센터)
김명진 (전자부품연구원 광부품연구센터) |
1 |
The characteristics of some metallic oxides prepared in high vacuum by ion bean sputtering
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DOI ScienceOn |
2 |
Effects of oxygen content of the properties of tantalum oxide films deposited by ion-beam sputtering
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DOI |
3 |
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4 |
The effect of errors in the optical monitoring of narrow-band all-dielectric thin film optical filters
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DOI ScienceOn |
5 |
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6 |
Morphology of dual ion beam sputtered films investigated by atomic force microscopy
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DOI ScienceOn |
7 |
Absorption in turning value monitoring of narrow-band thin-film optical filters
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DOI ScienceOn |
8 |
Turning value monitoring of narrow-band all-dielectric thin-film optical filters
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DOI ScienceOn |
9 |
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10 |
Design of Optical Interference Filter for DWDM
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DOI |
11 |
Temperature Stability of thin film narrow band pass filters produced by ion-assisted deposition
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DOI |
12 |
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13 |
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