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http://dx.doi.org/10.3807/KJOP.2003.14.3.331

Fabrication and optical characteristics of 50 ㎓ narrow band pass filter for fiber optical communication using dual ion beam sputtering technique  

김회경 (전자부품연구원 광부품연구센터)
김명진 (전자부품연구원 광부품연구센터)
Publication Information
Korean Journal of Optics and Photonics / v.14, no.3, 2003 , pp. 331-337 More about this Journal
Abstract
This paper represents 50 ㎓ narrow band pass filters for fiber optical communication fabricated by dual ion beam sputtering method. We have analyzed the characteristics of the TA$_2$ $O_{5}$ and $SiO_2$ single layers in order to optimize the process conditions for the 50 ㎓ narrow band pass filters, and controlled the film thickness uniformity to less than 0.1 nm deviation by dual peak spike filter pre-deposition. We designed and fabricated 50 ㎓ narrow band pass filters that consist of 216 layers including 4 cavities based on quarter wave optical thickness. Class substrates with high thermal expansion coefficients were used to reduce the film stress. Anti-reflection coating at the rear side of the substrate was also needed to reduce the optical thickness errors of the Optical Monitoring System caused by multiple beam interference between the front side and the rear side of substrate. The optical characteristics of this 50 ㎓ narrow band pass filters are insertion loss of 0.40 ㏈, pass band ripple of 0.20 ㏈, and pass bandwidth at -0.5 ㏈ of 0.20 nm. and isolation bandwidth at -25 ㏈ of 0.6 nm, which satisfy specifications of dense WDM system in fiber optical communications.tions.
Keywords
thin film; dual ion beam sputtering; narrow band pass filter; 50 GHz DWDM filter;
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