Studies of electron emitters for a miniaturized electron column design |
Kim, Young-Chul
(Dept. of Physics and Advanced Material Science, and Center for Next Generation Semiconductor Technology, Sunmoon University)
Kim, Dae-Wook (Dept. of Physics and Advanced Material Science, and Center for Next Generation Semiconductor Technology, Sunmoon University) Ahn, Seung-Joon (Dept. of Physics and Advanced Material Science, and Center for Next Generation Semiconductor Technology, Sunmoon University) Kim, Ho-Seob (Dept. of Physics and Advanced Material Science, and Center for Next Generation Semiconductor Technology, Sunmoon University) Jang, Won-Kweon (Dept. of Physics, Hansoe University) |
1 | H. S. Kim, M. L. Yu, U. Staufer, L. P. Muray, D. P. Kern, and T. H. P. Chang, “Oxygen processed field emission tips for microcolumn applications,” J. Vac. Sci. Technol. B, vol. 11, no. 6, pp. 2327-2331, 1993 DOI ScienceOn |
2 | M. L. Yu, B. W. Hussey, H. S. Kim, and T. H. P. Chang, “Emission characteristics of ultrasharp cold field emitters,” J. Vac. Sci. Technol. B, vol. 12, no. 6, pp. 3431-3435, 1994. DOI |
3 | E. Kratschmer, H. S. Kim, M. G. R. Thomson, K. Y. Lee, S. A. Rishton, M. L. Yu, and T. H. P. Chang, “Sub-40 nm resolution 1 keV scanning tunneling microscope fieldemission microcolumn,” J. Vac. Sci. Technol. B, vol. 12, no. 6, pp. 3503-3507, 1994. DOI |
4 | E. Kratschmer, H. S. Kim, M. G. R. Thomson, K. Y. Lee, S. A. Rishton, M. L. Yu, and T. H. P. Chang, “An electronbeam microcolumn with improved resolution, beam current, and stability,” J. Vac. Sci. Technol. B, vol. 13, no. 6, pp. 2498-2503, 1995. DOI |
5 | M. G. R. Thomson and T. H. P. Chang, “Lens and deflector design for microcolumns,” J. Vac. Sci. Technol. B, Vol. 13, no. 6, pp. 2445-2449, 1995. DOI |
6 | P. W. Hawkers and E. Kasper, Principles of Electron Optics (ACADEMIC PRESS, San Diego, USA, 1989), Chapter 26, vol. 1. |
7 | P. W. Hawkers and E. Kasper, Principles of Electron Optics (ACADEMIC PRESS, San Diego, USA, 1989), Chapter 24, vol. 1. |