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http://dx.doi.org/10.5302/J.ICROS.2009.15.12.1240

Throughput Analysis for Dual Blade Robot Cluster Tool  

Ryu, Sun-Joong (삼성전기 기판선형개발팀)
Publication Information
Journal of Institute of Control, Robotics and Systems / v.15, no.12, 2009 , pp. 1240-1245 More about this Journal
Abstract
The throughput characteristics of the cluster tool with dual blade robot are analyzed. Using equipment's cycle time chart of the equipment, simple analytic form of the throughput is derived. Then, several important throughput characteristics are analyzed by the throughput formula. First, utilization of the process chamber and the robot are maximized by assigning the equipment to the process whose processing time is near the critical process time. Second, rule for selecting optimal number of process chambers is suggested. It is desirable to select a single process chamber plus a single robot structure for relatively short time process and multi process chambers plus a single robot, namely cluster tool for relatively long time process. Third, throughput variation between equipments due to the wafer transfer time variation is analyzed, especially for the process whose processing time is less than critical process time. And the throughput and the wafer transfer time of the equipments in our fabrication line are measured and compared to the analysis.
Keywords
cluster tool; throughput; FAB; dry etch;
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  • Reference
1 T. L. Perkins, et aI., 'Single-wafer cluster tool perfonnance: an analysis of throughput,' IEEE Trans. Semiconductor Manufacturing, vol. 7, no. 3, pp. 369-373,1994   DOI   ScienceOn
2 S. V. Venkatesh, et. aI., 'A steady-state throughput analysis of cluster tools: dual-blade versus single-blade robots,' IEEE Trans. Semiconductor Manufacturing, vol. 10, no. 4, pp. 418-423,1997
3 J. P. Hong and K. S. Lee, 'Throughput analysis of the twin chamber platfonn equipment,' Journal of the Semiconductor & Display Equipment Technology, vol. 7, no. 2, 2008
4 C. Chu, et al, 'A petri net method for schedulability and scheduling problems in single-ann cluster tools with wafer residency time constraints,' IEEE Trans. Semiconductor Manufacturing, vol. 21, no. 2, 2008