Browse > Article
http://dx.doi.org/10.5302/J.ICROS.2006.12.11.1095

Wafer Position Sensing and Control in the Clean Tube System  

Kim, Yu-Jin (서울시립대학교 기계정보공학과)
Shin, Dong-Hun (서울시립대학교 기계정보공학과)
Publication Information
Journal of Institute of Control, Robotics and Systems / v.12, no.11, 2006 , pp. 1095-1101 More about this Journal
Abstract
The clean tube system was developed as a means of transferring air-floated wafers inside a closed tube filled with super clean air. This paper presents a wafer position sensing method in the clean tube system, where the photo proximity sensors are used. The first presented method uses the two positions sensed lately in order to compute the wafer center position. The next method uses the latest sensed position and the next latest position compensated with the information of the wafer velocity. The third method uses the kalman filter, which enable us to use all the previous sensing information. The simulation results are compared to show results of the presented method. In addition, the paper presents a control method to stop the wafer at the center of the unit in the clean tube system. The experimental clean tube system worked successfully with the applying the both presented methods of sensing and control.
Keywords
clean tube system; position decision; extended kalman filter; photo diode;
Citations & Related Records
Times Cited By KSCI : 2  (Citation Analysis)
연도 인용수 순위
1 S. S. RAO, MECANICAL VIBRATIONS, Third ed., Addison-Wesley, 128-146, 1995
2 M. Toda, M. Shishido, Y. Kanno, M. Umeda, T. Nitta and T. Ohmi, 'Wafer transportation through a tunnel filled whit nitrogen gas,' ICCCS, 1992, 173-183
3 W. A. Gross, Gas Film Lubrication, John Wiley & Sons, Inc., New York, 1962
4 J. D. Jackson and G. R. Symmons, Appl. Sci Res., A 15, 59-75, 1965   DOI
5 신동헌, 최철환, 정규식, '클린튜브 시스템의 웨이퍼 운동 제어', 설비공학 논문집, 제16권 제5호, pp. 475-481, 2004   과학기술학회마을
6 신동헌, 정규식, 윤정용, '클린튜브 시스템 이송 유닛의 웨이퍼 운동 역학 모델링', 한국정밀공학회지 제21권 제3호, pp. 66-73. 3, 2004   과학기술학회마을
7 M. Okano and S. Togo, 'Static Performance of Externally Pressurized Porous Gas Bearings,' Junkatsu, 20, 53-60, 1975
8 M. Toda, T. Ohmi, T. Nitta, Y. Saito, Y. Kanno, M. Umeda, M. Yagai, and H. Kidokoro., 'N2 Tunnel Wafer Transport System,' Journal of the IES(Institute of Environmental Sciences), 493-498, 1997
9 M. Toda, T. Ohmi, T. Onoda, M. Umeda, Y. Kanno, U. S. Patent 5,921,1744, 1999
10 T. Ohmi, 'Future Trends and Application of Ultra Clean Technology,' International ElectronDevices Meeting, Washing, D. C., 49-52, 1989   DOI
11 J. P. Babinski, B. I. Bertelsen, K. H. Raacke, V. H. sirgo and C. J. Townsend, U. S. Patent 3,976,330, 1976
12 J. A. Paivanas, J. K. Hanssan. and U. S. Patent 4,081,201, 1978
13 J. A. Paivanas and J. K. Hanssan, 'Air film system for handling semiconductor wafers,' IBM Journal research and development, 23, 1979, 361-375   DOI