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http://dx.doi.org/10.5207/JIEIE.2011.25.11.103

A Study on the Optical Emission Spectroscopy of the RF Inductive Plasma Process  

Jang, Mun-Gug (경남대학교 전기공학과)
Han, Sang-Bo (경남대학교 전기공학과)
Park, Sang-Hyun (경남대학교 전기공학과)
Publication Information
Journal of the Korean Institute of Illuminating and Electrical Installation Engineers / v.25, no.11, 2011 , pp. 103-112 More about this Journal
Abstract
This paper is tried to analysis the optical emission spectroscopy related to the position of inductive load coil and flow rates of methane and oxygen in the RF inductive plasma process. According to the position of load coil, peak of $H_{\alpha}$, $H_{\beta}$, and CH were appeared strongly at the middle position of the coil and it decreased both direction. The electron temperature was approximately 0.9[eV] at that position. Emission intensities of $H_{\alpha}$, $H_{\beta}$, and CH increased linearly by increasing input power. In addition, intensities of $H_{\alpha}$ and $H_{\beta}$ increased by increasing the flow rate of oxygen. It might be ascribed that the oxygen species were bonded with $C_nH_m$ by suppressing the combination with hydrogen atoms. Consequently, the optimal position of the inductive coil is decided to the intermediate position between 4th and 5th turns, the wanted carbon thin-film is possible to deposit by controlling flow rates of methane and oxygen.
Keywords
Hydrogen; Methane; Optical Emission Spectroscopy; RF Inductive Plasma Process;
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1 Qingwen Li, Hao Yan, Jin Zhang, Zhongfan Liu, "Effect of hydrocarbons precursors on the formation of carbon nanotubes in chemical vapor deposition", Carbon, Vol. 42, pp. 829-835, 2004.   DOI
2 I Gallimberti J K Hepworth and R C Klewe, "Spectroscopic investigation of impulse corona discharges", J. Phys. D:Appl. Phys., Vol. 7, pp. 880-889, 1974.   DOI
3 N K Bibinov, A A Fateev and K Wiesemann, "On the influence of metastable reactions on rotational temperatures in dielectric barrier discharges in $He-N_2$ mixtures", J. Phys. D:Appl. Phys., Vol. 34, pp. 1819-1826, 2001.   DOI
4 Jialiang Zhang, Liying Liu, Tengcai Ma, Xinlu Deng, "Rotational temperature of nitrogen glow discharge obtained by optical emission spectroscopy", Spectrochimica Acta part A, Vol. 58, pp. 1915-1922, 2002.   DOI
5 F Bourg, S Pellerin, D Morvan, J Amouroux and J Chapelle. "Spectroscopic diagnostic of an argon-hydrogen RF inductive thermal plasma torch at atmospheric pressure used for silicon hydrogenation", J. Phys. D:Appl. Phys., Vol. 35, pp. 2281-2290, 2002.   DOI
6 E. Tatarova, F.M Dias, H. van Kuijk, C.M Ferreira. "Emission spectroscopy of a surface wave sustained $N_2-H_2$ discharge", Vaccum, Vol. 69, pp. 189-193, 2003.
7 H Nassar, S Pellerin, K Musiol, O Martinie, N Pellerin, and J-M Cormier, "N2+/N2 ratio and temperature measurements based on the first negative N2+ and second positive N2 overlapped molecular emission spectra", J. Phys. D: Appl. Phys., Vol. 37, pp. 1904-1916, 2004.   DOI
8 J.L. Qi, W.T. Zheng, X.H. Zheng, X. Wang, H.W. Tian, "Relatively low temperature synthesis of graphene by radio frequency plasma enhanced chemical vapor deposition", App. Surf. Sci., Vol. 257, No. 15, pp. 6531-6534, 2011.   DOI
9 Lei Liao, Xiangfeng Duan, "Graphene-dielectric integration for graphene transistors", Materials Sci. and Eng., R: Reports, Vol. 70, No. 3-6, pp. 354-370, 2010.   DOI
10 Noriaki Ikenaga, Kaoru Awazu, Noriyuki Sakudo, Haruyuki Yasui, Takeshi Kawabata, "Effect of electron temperature on the DLC film properties", Surface and Coatings Tech., Vo. 196, No. 1-3, pp. 226-230, 2005.   DOI
11 Francis F. Chen, Jane P. Chang, "Principles of Plasma Processing", Univ. of California, book.
12 일본 학술진흥회 플라즈마 재료과학 제153위원회 편, "플라즈마 재료과학 핸드북", 오옴사, 1992.