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http://dx.doi.org/10.7736/KSPE.2012.29.3.334

Electrical Isolation of Ag Nanowire Film using Femtosecond Laser  

Yoon, Ji-Wook (Department of Nano Manufacturing Technology, Korea Institute of machinery and materials)
Park, Jung-Kyu (Department of Nano Manufacturing Technology, Korea Institute of machinery and materials)
Boehme, Daniel (JENOPTIK Korea Corporation, Ltd.)
Zander, Sebastian (JENOPTIK Korea Corporation, Ltd.)
Cho, Sung-Hak (Department of Nano Manufacturing Technology, Korea Institute of machinery and materials)
Publication Information
Abstract
Electrical isolation of Ag nanowire, which is one of the candidates as electrode for display devices, on polymer with femtosecond pulse laser has been investigated. Line patterning to Ag nanowire with various pulse energy and scan speed were experimented. Duo to the results of the line patterning experiment, we fabricated the isolated squares and measured electrical resistance. The profile of the selectively ablated area was analyzed with AFM(Atomic Force Microscope). The width of the patterned line was $1.8\;{\mu}m$ and the depth was $1.6\;{\mu}m$. We demonstrated electrical isolation of the Ag nanowire using femtosecond laser by evaluating the electrical resistance of the sample between isolated and opened area.
Keywords
Femtosecond Laser; Electrical Isolation; Ag Nanowire;
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Times Cited By KSCI : 2  (Citation Analysis)
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