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Development of Inductively Coupled Plasma Gas Ion Source for Focused Ion Beam  

Lee, Seung-Hun (Korea Institute of Materials Science)
Kim, Do-Geun (Korea Institute of Materials Science)
Kang, Jae-Wook (Korea Institute of Materials Science)
Kim, Tae-Gon (School Mechanical Engineering, Yonsei Univ.)
Min, Byung-Kwon (School Mechanical Engineering, Yonsei Univ.)
Kim, Jong-Kuk (Korea Institute of Materials Science)
Publication Information
Journal of the Korean Society for Precision Engineering / v.28, no.1, 2011 , pp. 19-23 More about this Journal
Abstract
Recently, focused ion beam (FIB) applications have been investigated for the modification of VLSI circuit, the MEMS processing, and the localized ion doping, A multi aperture FIB system has been introduced as the demands of FIB applications for high speed and large area processing increase. A liquid metal ion source has problems, a large angular divergence and a metal contamination into a substrate. In this study, a gas ion source was introduced to replace a liquid metal ion source. The gas ion source generated inductively coupled plasma (ICP) in a quartz tube (diameter: 45 mm). Ar gas fed into the quartz was ionized by a 2 turned radio frequency antenna. The Ar ions were extracted by 2 extraction grids. The maximum extraction voltage was 10 kV. A numerical simulation was used to optimize the design of extraction grids and to predict an ion trajectory. As a result, the maximum ion current density was 38 $mA/cm^2$ and the spread of ion energy was 1.6 % for the extraction voltage.
Keywords
Inductively Coupled Plasma; Focused ion Beam; Gas Ion Source;
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