Browse > Article

Research for Patent Application Tendency in the In-Line System Manufacturing for Component of Nano Scale  

Kim, Seung-Min (특허청 제어기계심사팀)
Ko, Jun-Bin (국립 한밭대학교 기계설계공학과)
Park, Hee-Sang (충남대학교 기계공학과 대학원 BK21메카트로닉스 사업단)
Publication Information
Journal of the Korean Society for Precision Engineering / v.25, no.6, 2008 , pp. 150-158 More about this Journal
Abstract
This research considered that the significance of the NT(Nano Technology) which gradually increased the importance of it and investigated the technology development current situation of the Korea, U.S.A, Japanese, Europe. Therefore, in domestic and foreign, this research was widely used. It includes the tendency of the technology about processing methods using the ion beam and electron beam among the In-line system related technique field for the high efficiency energy beam application nano scale manufacturing components. The technique level of Korea, the international trend of technology and cooperation research present condition are dealt in. The information about the checked out of business of research and development of the country consistency and policy establishment try to be provided.
Keywords
Nano Technology; Ion Beam; Electron Beam;
Citations & Related Records
Times Cited By KSCI : 5  (Citation Analysis)
연도 인용수 순위
1 Moon, J. I., Kim, B. T., Kim, Y. I. and Heo, S. J., "A Study on the Cutting Conditions in Machining for Nanometer Surface," Journal of the Korean Society for Precision Engineering, Vol. 15, No. 9, pp. 152-157, 1998
2 Ando, M., Matsuzaka, M. and Saita, M., "Multiple-Imaging Charged Particle-Beam Exposure System," United States Patent and Trademark Office, US 5012105 A, 1991
3 Yasuda, H. and Komami, H., "Electron Beam Exposure Method and Electron Beam Exposure Apparatus," United States Patent and Trademark Office, US 6218060 B1., 2001
4 Principe, E., "Method and Apparatus for Quantitative Three-Dimensional Reconstruction in Scanning Electron Microscopy," European Patent Office, EP 1710828 A2., 2006
5 Choi, H. Z., Kang, E. G., Lee, S. W. and Hong, W. P., "Development of Micro Plasma Electrode using Focused Ion Beam," Journal of the Korean Society for Precision Engineering, Vol. 22, No. 5 pp. 175-180, 2005   과학기술학회마을
6 Bang, J. H., Kwon, K. H. and Cho, N. G., "Development of an Ultra Precision Machining System Using a Force and Displacement Sensing Module," Journal of the Korean Society for Precision Engineering, Vol. 22, No. 12 pp. 42-50, 2005   과학기술학회마을
7 Gerlach, R. L., Tesch, P. P., Swanson, L. W. and Utlaut, M. W., "Multi-Column Fib for Nano fabrication Applications," United States Patent and Trademark Office, US 6797969 B2., 2004
8 Park, J. W. and Lee, D. W., "Fabrication of Micro Diamond Tip Cantilever for AFM-based Tribo-Nano lithography," Journal of the Korean Society for Precision Engineering, Vol. 23, No. 8 pp. 39-46, 2006   과학기술학회마을
9 Lee, C. O., Shin, K. W., Lee, J. S., Cho, S. J., Lee, C. H. and So, J. Y., "Montecarlo Simulation of the Thermal Neutron Reflectometer with Horizontal Sample Geometry for Surface Characterization of Nanostructured thin films," Journal of the Korean Vacuum Society, Vol. 14, No. 3, pp. 119-125, 2005   과학기술학회마을
10 Aita, K., "Focused Ion Beam apparatus," United States Patent and Trademark Office, US 6642512 B2., 2003
11 Lee, S. H. and Son, J. M., "Optimization of Nano Machining Parameters Using Acoustic Emission and the Taguchi Method," Journal of the Korean Society for Precision Engineering, Vol. 21, No. 3 pp. 163-170, 2004