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Ion Beam Induced Micro/Nano Fabrication: Modeling  

Kim, Heung-Bae (비엔나공과대학 전자공학과)
Hobler, Gerhard (비엔나공과대학 전자공학과)
Publication Information
Journal of the Korean Society for Precision Engineering / v.24, no.8, 2007 , pp. 108-115 More about this Journal
Abstract
3D nano-scale manufacturing is an important aspect of advanced manufacturing technology. A key element in ability to view, fabricate, and in some cases operate micro-devices is the availability of tightly focused particle beams, particularly of photons, electrons, and ions. The use of ions is the only way to fabricate directly micro-/ nano-scale structures. It has been utilized as a direct-write method for lithography, implantation, and milling of functional devices. The simulation of ion beam induced physical and chemical phenomena based on sound mathematical models associated with simulation methods is presented for 3D micro-/nanofabrication. The results obtained from experimental investigation and characteristics of ion beam induced direct fabrication will be discussed.
Keywords
Focused Ion Beam; Nanofabrication; Simulation; Redeposition; Sputtering;
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