1 |
Ivor, I. and Julius, J. M., 'The Physics of Micro / Nano-Fabrication,' Plenum Press, 1992
|
2 |
Itoh, F., Shimase, A. and Haraichi, S., 'Twodimension profile simulation of focused ion beam milling of LSI,' J. Electrochem. Soc., Vol. 137, Issue 3, pp. 983-988, 1990
DOI
|
3 |
Hecht, E., 'OPTICS,' 4th Edition, Addison Wesley Longman Inc., 2002
|
4 |
Fisher, R. E. and Caleb, B. T., 'Optical system design,' McGraw-Hill, 2000
|
5 |
Ishitani, T. and Ohnishi, T., 'Modeling of sputtering and redeposition in focused-ion-beam trench milling,' J. Vac. Sci. Technol. A, Vol. 9, Issue 9, pp. 3084-3090, 1991
|
6 |
Young, R. J., 'Micro-machining using a focused ion beam,' Vacuum, Vol. 44, Issue 3. pp. 353-362, 1993
DOI
ScienceOn
|
7 |
Yamaguchi, H., Shimase, A., Haraichi, S. and Miyauchi, T., 'Characteristics of silicon removal by fine focused ion beam,' J. Vac. Sci. Technol. B, Vol. 3, Issue1, pp. 71-82, 1985
|
8 |
Adams, D. P. and Vasile, M. J., 'Accurate focused ion beam sculpting of silicon using a variable pixel dwell time approach,' J. Vac. Sci. Technol. B, Vol' 24, Issue 2,pp. 836-844, 2006
DOI
ScienceOn
|
9 |
Gianuzzi, A. L. and Stevie, F. A., 'Introduction to Focused Ion Beams,' Springer, 2005
|
10 |
Harriott, L. R., 'Micro focused ion beam applications in microelectronics,' Appl. Surf. Sci., Vol. 36, Issue 1, pp.432-439,1989
DOI
ScienceOn
|
11 |
Vasile, M. J., Xie, J. and Nassar, R. J., 'Depth control of focused ion-beam milling a numerical model of the sputtered process,' J. Vac. Sci. Technol. B, Vol. 17, Issue 6, pp. 3085-3090, 1999
DOI
ScienceOn
|
12 |
Driesel, W., 'Micromachining using focused ion beams,' Physica Status Solidi, Vol. 146, Issue 1, pp. 523-530, 1994
DOI
ScienceOn
|
13 |
Fu, Y., Bryan, N. K. A. and Zhou, W., 'Selforganized formation of a blazed-grating-like structure on Si(100) induced by focused ion-beam scanning,' Opt. Express, Vol. 12, Issue 2, pp. 227-233,2004
DOI
|
14 |
Kim, H. B. and Hobler, G., 'Ion beam induced micro/nano fabrication: Modeling,' J. KSPE, Vol. 24, No.8, pp. 108-115,2007
과학기술학회마을
|
15 |
Fu, Y. and Bryan, N. K., 'Semiconductor Microlenses Fabricated by One-Step Focused Ion Beam Direct Writing,' IEEE Trans. SemiconManu., Vol. 15, No.2, pp. 229-231, 2002
|
16 |
Xu, X., Ratta, A. D. D., Sosonkina, J. and Melngailis, J., 'Focused ion beam induced deposition and ion milling as a function of angle of ion incidence,' J. Vac. Sci. Technol. B, Vol. 10, Issue 6, pp. 2675-2683, 1992
DOI
|
17 |
Kubena, R. L., Sieiger, R. L. and Stevens, E. H., 'High resolution sputtering using a focused ion beam,' Thin Solid Film, Vol. 92, Issue 1, pp. 165-169, 1982
DOI
ScienceOn
|
18 |
Fu, Y. and Bryan, N. K. A., 'Fabrication of threedimensional microstructures by two-dimensional slice by slice approaching via focused ion beam milling,' J. Vac. Sci. Technol. B, Vol. 22, Issue 4, pp. 1672-1678, 2004
DOI
ScienceOn
|
19 |
Bradley, R. M. and Harper, J. M. E., 'Theory of ripple topography induced by ion beam bombardment,' J. Vac. Sci. Technol' A, Vol. 6, Issue 4, pp. 2390-2395, 1988
DOI
|