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Ion Beam Induced Micro/Nano Fabrication: Shape Fabrication  

Kim, Heung-Bae (비엔나공과대학 전자공학과)
Hobler, Gerhard (비엔나공과대학 전자공학과)
Publication Information
Journal of the Korean Society for Precision Engineering / v.24, no.10, 2007 , pp. 109-116 More about this Journal
Abstract
Focused ion beams are a potential tool for micro/nano structure fabrication while several problems still have to be overcome. Redeposition of sputtered atoms limits the accurate fabrication of micro/nano structures. The challenge lies in accurately controlling the focused ion beam to fabricate various arbitrary curved shapes. In this paper a basic approach for the focused ion beam induced direct fabricate of fundamental features is presented. This approach is based on the topography simulation which naturally considers the redeposition of sputtered atoms and sputtered yield changes. Fundamental features such as trapezoidal, circular and triangular were fabricated with this approach using single or multiple pass box milling. The beam diameter(FWHM) and maximum current density are 68 nm and $0.8 A/cm^2$, respectively. The experimental investigations show that the fabricated shape is well suited for the pre-designed fundamental features. The characteristics of ion beam induced direct fabrication and shape formation will be discussed.
Keywords
Focused Ion Beam; Nano Fabrication; Simulation; Redeposition; Sputtering;
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Times Cited By KSCI : 1  (Citation Analysis)
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