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Two-dimensional Nano-patterning with Immersion Holographic Lithography  

Kim, Sang-Won (연세대학교 기계공학과 나노광자공학 연구실)
Park, Sin-Jeung (연세대학교 기계공학과 나노광자공학 연구실)
Kang, Shin-Il (연세대학교 기계공학과 나노성형및광부품기술 연구실)
Hahn, Jae-Won (연세대학교 기계공학과 나노광자공학 연구실)
Publication Information
Journal of the Korean Society for Precision Engineering / v.23, no.12, 2006 , pp. 128-134 More about this Journal
Abstract
Two-dimensional nano-patterns are fabricated using immersion holographic lithography. The photoresist layer is exposed to an interference pattern generated by two incident laser beams($\lambda$=441.6 nm, He-Cd laser) of which the pitch size is less than 200 nm. Good surface profiles of the 2 dimensional patterns are achieved by trimming the lithography process parameters, such as, exposure time, developing time and refractive index of medium liquid.
Keywords
aspect ratio; develop time; exposure time; holographic lithography; immersion lithography; photoresist; polarization;
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