Browse > Article

Aligning Method using Concentric $Moir\ in Nanoimprint Lithography  

Kim, Gee-Hong (한국기계연구원 나노공정장비연구센터)
Lee, Jae-Jong (한국기계연구원)
Choi, Kee-Bong (한국기계연구원)
Park, Soo-Yeon (한국기계연구원)
Cho, Hyun-Taek (한국기계연구원)
Lee, Jong-Hyun (한국기계연구원)
Publication Information
Journal of the Korean Society for Precision Engineering / v.23, no.11, 2006 , pp. 34-41 More about this Journal
Abstract
Nanoimprint lithography is an emerging technology which has an ability to make patterns under 100nm width. Recently many researches have been focused to develop multilayer patterning function in nanoimprint lithography and aligning method is attracting attention as a key technology. $Moir\ has been used widely to measure dislocation or deformation of objects and considered one of the best solutions to detect aligning error in nanoimprint lithography. Concentric circular patterns are used to generate a $moir\ fringe in this paper and aligning offset and direction are extracted from it. Especially this paper shows the difference of fringe equation of $moir\ which can be obtained in nanoimprint process atmosphere from normal one.
Keywords
Nanoimprint; $Moir\; Aligning Method; Lithography;
Citations & Related Records
Times Cited By KSCI : 1  (Citation Analysis)
연도 인용수 순위
1 Muhlberger, M., Schwinger, W., Gmainer, M., Schoftner, R., Glinsner, T., HasenfuB, Ch., Hingerl, K., Schmidt, H. and Kley, E. B., 'High Precision Alignment in Multi-Layer Nanolmprint Lithography,' 6th IntI. Cof. of EUSPEN, Vol. I, pp. 309, 2006
2 Yokozeki, S., Kusaka, Y. and Patoriski, K., 'Geometric parameters of moire fringes,' Appl. Opt., Vol. 15, No.9, pp. 2223, 1976   DOI   ScienceOn
3 Malacara, D., Servin, M. and Malacara, Z., 'Interferogram analysis for optical testing,' Marcel Dekker, New York, Ch. 5, 1998
4 Post, D., Han, B. and Ifju, P., 'High Sensitivity Moire Experimental Analysis for Mechanics and Materials,' Springer-Verlag, New York, pp.106, 1994
5 Bryngdahl, O., 'Moire and higher grating harmonics,' J. Opt. Soc. Am., Vol. 65, No.6, pp. 685, 1975   DOI   ScienceOn
6 Flanders, D. C. and Smith, H. I., 'A new interferometric alignment technique,' Appl. Phy. Lett., Vol. 31, No.7, pp. 426, 1977   DOI
7 Une, A., Takeuchi, N. and Torii, Y., 'A high-accuracy alignment technique using single-and double-pitch dual gratings,' J. Vac. Sci. Technol B, Vol. 8, No.1, pp. 51, 1990   DOI
8 Moon, E. E., Lee, J. W., Everett, P. N. and Smith, H. I., 'Application of interferometric broadband imaging alignment on an experimental x-ray stepper,' J. Vac. Sci. Tech. B, Vol. 16, No.6, pp. 3631, 1998   DOI   ScienceOn
9 Park, Y. C., 'Measurement of Radial Motion of Spindlε by Moire Phenomenon,' Ph. D. Dissertation, KAIST, 1993
10 Park, Y. C. and Kim, S. W., 'Measurement of Radial Error Motions of a Rotating Spindle by Moire Topography,' Journal of the KSME, Vol. 17, No. 11, pp. 2723, 1993   과학기술학회마을
11 Chou, S. Y., Krauss, P. R. and Renstrom, P. J., 'Nanoimprint lithography,' J. Vac. Sci. Tech. B, Vol 14, No.6, pp. 4129, 1996   DOI   ScienceOn