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Relation of AE and Polishing Parameters for Polishing Process Monitoring  

Kim, Hwa-Young (부산대학교 산학협력단)
Kim, Jeong-Uk ((재)부산테크노파크 기계부품소재 기술지원센터)
Yoon, Hang-Mook (동의대학교 도시공학과)
Ahn, Jung-Hwan (부산대학교 기계공학부)
Kim, Sung-Ryul (부산대학교 지능기계공학과)
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Abstract
A monitoring system is necessary to make the polishing process more reliable in order to ensure the high quality and performance of the final products. Generally, AE (Acoustic Emission) is known to be closely related to the material removal rate (MRR). As the surface becomes rougher, the MRR and AE increase. Therefore, the surface roughness can be indirectly estimated using the AE signal measured during the polishing. In this study, an AE sensor-based monitoring system was fabricated to detect the very small AE signal resulting from the friction between a tool and a workpiece during polishing. The performance of this monitoring system was estimated according to polishing conditions, the relation between the level of the AE RMS and the surface roughness during the polishing was investigated.
Keywords
Polishing; Acoustic emission (AE); Monitoring; Surface roughness; Effective removal rate;
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