Browse > Article
http://dx.doi.org/10.4313/JKEM.2022.35.2.15

Comment on "Structural, Electrical, and Optical Properties of AGZO Thin Films Using by RF Magnetron Sputtering System under Ar Flow Rates"  

Kim, Sangmo (School of Intelligent Mechatronics Engineering, Sejong University)
Publication Information
Journal of the Korean Institute of Electrical and Electronic Material Engineers / v.35, no.2, 2022 , pp. 199-201 More about this Journal
Keywords
Citations & Related Records
Times Cited By KSCI : 1  (Citation Analysis)
연도 인용수 순위
1 S. H. Jang and D. K. Kim, J. Korean Inst. Electr. Electron. Mater. Eng., 35, 32 (2022). [DOI: https://doi.org/10.4313/JKEM.2022.35.1.5]   DOI
2 M. A. Lieberman and A. J. Lichtenberg, Principles of Plasma Discharges Materials Processing, 2nd edn. (John Willey & Sons., 2005).
3 B. Chapman and J. L. Vossen, Phys. Today, 34, 62 (1981). [DOI: https://doi.org/10.1063/1.2914660]   DOI
4 B. N. Chapman, Sputtering (Wiley, New York, 1980). pp. 177-296.
5 M. Ohring, Materials Science of Thin Films, 2nd edn. (Academic Press, 2002). pp. 711-781. [DOI: https://doi.org/10.1016/b978-012524975-1/50015-x]   DOI
6 J. A. Thornton, Ann. Rev. Mater. Sci., 7, 239 (1977). [DOI: https://doi.org/10.1146/annurev.ms.07.080177.001323]   DOI
7 K. Wasa, I. Kanno, and H. Kotera, Handbook of Sputter Deposition Technology, 2nd edn. (Willian Andrew, 2012).
8 J. A. Thornton, J. Vac. Sci. Technol., 11, 666 (1974). [DOI: https://doi.org/10.1116/1.1312732]   DOI