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http://dx.doi.org/10.4313/JKEM.2016.29.7.414

A Study on the Metal Mesh for CuNx-Cu-CuNx Multi-layer Touch Electrode by Reactive Magnetron Sputtering  

Kim, Hyun-Seok (Department of Advanced Material, Korea Polytechnic)
Yang, Seong-Ju (Department of Advanced Material, Korea Polytechnic)
Noh, Kyeong-Jae (Department of Advanced Material, Korea Polytechnic)
Lee, Seong-Eui (Department of Advanced Material, Korea Polytechnic)
Publication Information
Journal of the Korean Institute of Electrical and Electronic Material Engineers / v.29, no.7, 2016 , pp. 414-423 More about this Journal
Abstract
In the present study, the $CuN_x-Cu-CuN_x$ layer the partial pressure ratio Cu metal of Ar and $N_2$ gas using a DC magnetron sputtering device, was generated by the In-situ method. $CuN_x$ layer was able to obtain a surface reflectance reduction effect from the advantages of the process and the external light. $CuN_x$ layer is gas partial pressure, DC the Power, the deposition time variable transmittance in response to the thickness and partial pressure ratio, the reflectance was measured. $Ar:N_2$ gas ratio 10:10(sccm), DC power 0.35 A, was derived Deposition time 90 sec optimum conditions. Thus, according to the optimal thickness and the composition ratio was derived surface reflectance of 20.75%. In addition, to derive the value of ${\Delta}$ Ra surface roughness of 0.467. It was derived $CuN_x$ band-gap energy of about 2.2 eV. Thus, to ensure a thickness and process conditions can be absorbed to maximize the light in a wavelength band in the visible light region. As a result, the implementation of the $12k{\Omega}$ base line resistance of using the Cu metal. This is, 5 inch Metal mesh TSP(L/S: $4/270{\mu}m$) is in the range of the reference operation.
Keywords
ITO; Metal mesh; Starburst; Reflectance; Absorptance; Band-gap;
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