Browse > Article
http://dx.doi.org/10.4313/JKEM.2016.29.5.279

Simultaneous Realization of Electromagnetic Shielding and Antibacterial Effect of Al Doped ZnO Thin Films onto Glass Substrate  

Choi, Hyung-Jin (Department of Materials Science and Engineering, Chungnam National University)
Yoon, Soon-Gil (Department of Materials Science and Engineering, Chungnam National University)
Publication Information
Journal of the Korean Institute of Electrical and Electronic Material Engineers / v.29, no.5, 2016 , pp. 279-283 More about this Journal
Abstract
In this study, we intended to achieve both antibacterial properties and electromagnetic shielding using the Al-doped ZnO (AZO) films. FTS (Facial Target Sputtering) magnetron sputtering was used for the AZO thin films instead of the conventional RF sputtering because the FTS sputtering could avoid the damage for the plasma as well as fabrication of thin films with a high quality. The 300-nm thick AZO thin films grown on glass substrate showed a resistivity of about $7{\times}10^{-4}{\Omega}-cm$ and a transmittance of about 90% at a wavelength of 550 nm. AZO thin films were investigated for the electromagnetic shielding effectiveness measured by 2-port network method at 1.5 ~ 3 GHz. The AZO (300 nm)/glass films showed an EMI shielding effectiveness of approximately 27 dB. An antibacterial effect was measured by the film attachment method (JIS Z 2801). The percent reductions of bacteria by AZO films were 99.99668% and 99.99999% against Staphylococcus aureus and Escherichia coli, respectively.
Keywords
EMI shielding; Antibacterial activity; AZO; Sputtering;
Citations & Related Records
Times Cited By KSCI : 1  (Citation Analysis)
연도 인용수 순위
1 S. S. Tzeng and F. Y. Chang, Mat. Sci. and Eng., 302, 258 (2001). [DOI: http://dx.doi.org/10.1016/S0921-5093(00)01824-4]   DOI
2 D. Y. Kim, K. J. Yun, and Y. S. Lee, Appl. Chem. Eng., 25, 268 (2014). [DOI: http://dx.doi.org/10.14478/ace.2014.1021]   DOI
3 K. C. Song, S. M. Lee, T. S. Park, and B. S. Lee, Kor. J. Chem. Eng., 26, 153 (2009). [DOI: http://dx.doi.org/10.1007/s11814-009-0024-y   DOI
4 H. J. Choi, J. S. Choi, B. J. Park, J. H. Eom, S. Y. Heo, M. W. Jung, K. S. An, and S. G. Yoon, Sci. Rep., 4, 6271 (2014). [DOI: http://dx.doi.org/10.1038/srep06271]   DOI
5 M. Arakha, M. Saleem, C. B. Mallick, and S. Jha, Sci. Rep., 6, 9578 (2015). [DOI: http://dx.doi.org/10.1038/srep09578]
6 H. J. Choi, H. J. Jung, S. G. Hur, and S. G. Yoon, J. Korean Inst. Electr. Electron. Mater. Eng., 24, 126 (2011).
7 K. Hiroki, JIS Z 2801; Japanese Standards Association:Tokyo (2000).
8 X. Xu, D. Chen, Z. Yi, M. Jiang, L. Wang, Z. Zhou, X. Fan, Y. Wang, and D. Hui, Langmuir, 29, 5573 (2013). [DOI: http://dx.doi.org/10.1021/la400378t]   DOI
9 J. Pasuet, Y. Chevalier, J. Pelletier, E. Couval, D. Bouvier, and M. A. Bolzinger, Colloids and Surfaces A: Physicochem. Eng. Aspects, 457, 263 (2014). [DOI: http://dx.doi.org/10.1016/j.colsurfa.2014.05.057]   DOI
10 A. B. Djurisic, Y. H. Lung, A.M.C. Ng, X. Y. Xu, P. K. H. Lee, N. Degger, and R.S.S. Wu, Small, 11, 26 (2015). [DOI: http://dx.doi.org/10.1002/smll.201303947]   DOI