High Quality AlN Layer Regrown on AlN Nanostructure by Hydride Vapor Phase Epitaxy
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Son, Hoki
(Korea Institute of Ceramic Engineering & Technology)
Gim, Jinwon (Korea Institute of Ceramic Engineering & Technology) Lim, Tea-Young (Korea Institute of Ceramic Engineering & Technology) Lee, Mijai (Korea Institute of Ceramic Engineering & Technology) Kim, Jin-Ho (Korea Institute of Ceramic Engineering & Technology) Jeon, Dae-Woo (Korea Institute of Ceramic Engineering & Technology) Hwang, Jonghee (Korea Institute of Ceramic Engineering & Technology) Oh, Hae-Kon (LumiGNtech Co.) Choi, YoungJun (LumiGNtech Co.) Lee, Hae-Yong (LumiGNtech Co.) |
1 | M. Balaji, A. Claudel, V. Fellmann, I. Gelard, E. Blanquet, R. Boichot, A. Pierret B. Attal-Tretout, A. Crisci, S. Coindeau, H. Roussel, D. Pique, K. Baskar, and M. Pons, J. Alloys Comp., 526, 103 (2012). [DOI: http://dx.doi.org/10.1016/j.jallcom.2012.02.111] DOI ScienceOn |
2 | K. Fujita, K. Okuura, H. Miyake, K. Hiramatsu, and H. Hirayama, Phys. Status Solidi C, 5, 1483 (2011). [DOI: http://dx.doi.org/10.1002/pssc.201001130] DOI ScienceOn |
3 | H. Hirayama, S. Fujikawa, J. Norimatsu, T. Takano, K. Tsubaki, and N. Kamata, Phys. Status Solidi C, S5, S356 (2009). [DOI: http://dx.doi.org/10.1002/pssc.200880958] DOI |
4 | T. Nagashima, M. Harada, H. Yanagi, H. Fukuyama, Y. Kumagai, A. Koukitu, and K. Takada, J. Crystal Growth, 305, 355 (2007). [DOI: http://dx.doi.org/10.1016/j.jcrysgro.2007.04.001] DOI ScienceOn |
5 | Y. Kumagai, Y. Enatsu, M. Ishizuki, Y. Kubota, J. Tajima, T. Nagashima, H. Murakami, K. Takada, and A. Koukitu, J. Crystal Growth, 312, 2530 (2010). [DOI: http://dx.doi.org/10.1016/j.jcrysgro.2010.04.008] DOI ScienceOn |
6 | V.Y.U. Davydov, Y.U.E. Kitaev, I. N. Goncharuk, A. N. Smirnov, J. Graul, O. Semchinova, D. Uffmann, M.B Smirnov, A. P. Mirgorodsky, and R. A. Evarestov, Phys. Rev. B (American Physical Society, U. S., 1998) p. 12899. |
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