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http://dx.doi.org/10.4313/JKEM.2014.27.8.510

Phase Formation Behavior and Electrical Conduction Properties of Na0.6WO3 Thin Films Prepared by RF Sputtering Followed by Annealing  

Lee, Seung-Hyun (Department of Materials Science and Engineering, Kunsan National University)
Sun, Ho-Jung (Department of Materials Science and Engineering, Kunsan National University)
Publication Information
Journal of the Korean Institute of Electrical and Electronic Material Engineers / v.27, no.8, 2014 , pp. 510-515 More about this Journal
Abstract
Thin films of cubic $Na_{0.6}WO_3$, which is one of the sodium tungsten bronze, were fabricated by rf sputtering for the electrode applications in integrated sensors and actuators. A single-phase cubic $Na_{0.6}WO_3$ sputtering target of power type was prepared by conventional solid-state reaction. Thin films were deposited from the powder target, and the as-deposited films were amorphous, thus they annealed by tube furnace or RTP for crystallization. Thin films having cubic phase $Na_xWO_3$ were fabricated by the optimization of sputtering and post-annealing conditions, but single-phase cubic $Na_{0.6}WO_3$ thin films were not obtained. Although the films were not in single phase, they had good electrical conduction properties showing electrical resistivities of $10-4{\Omega}{\cdot}cm$ order.
Keywords
$Na_{0.6}WO_3$; Sodium tungsten bronze; Thin film; rf sputtering; Electrical conduction;
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