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http://dx.doi.org/10.4313/JKEM.2013.26.5.397

Characterization of the Crystallized ITO Thin Films Grown at Different Temperatures by Off-axis RF Magnetron Sputtering  

Choi, Hyung-Jin (Department of Materials Science and Engineering, Chungnam National University)
Yoon, Soon-Gil (Department of Materials Science and Engineering, Chungnam National University)
Publication Information
Journal of the Korean Institute of Electrical and Electronic Material Engineers / v.26, no.5, 2013 , pp. 397-400 More about this Journal
Abstract
Off-axis magnetron sputtering was used for the crystallized ITO thin films deposition at various temperatures from 25 to $120^{\circ}C$. The ITO thin films were crystallized at $50^{\circ}C$ for Si (001) substrates and at $75^{\circ}C$ for PET substrate. The ITO thin films grown onto PET substrate at $120^{\circ}C$ were crystallized with a (222) preferred orientation. The 160-nm thick ITO films showed a resistivity of about $7{\times}10^{-4}{\Omega}{\cdot}cm$ and a transmittance of about 84% at a wavelength of 550 nm. Off-axis sputtering can be applied for low temperature crystallization of the ITO films.
Keywords
ITO; TCO; Off-axis sputtering; PET;
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1 S. Li, X. Qiao, and J. Chen, Mater. Chem. Phys., 98, 144 (2006).   DOI   ScienceOn
2 W. Song, J. KIEEME, 17, 1277 (2004).
3 J. T. Hwang, J. M. Son, I. N. Kang, and Y. S. Bu, Polym. Sci. Technol., 14, 554 (2003).
4 K. Maki, N. Komiya, and A. Szuki, Thin Solid Films, 455, 224 (2003).
5 T. Kondo, Y. Sawada, K. Akiyama, and H. Funakubo, Thin Solid Films, 516, 5864 (2008).   DOI   ScienceOn
6 S. Venkat, N. J. Seong, and S. G. Yoon, Scripta Materialia, 61, 867 (2009).   DOI   ScienceOn
7 H. J. Choi, H. J. Jung, S. G. Hur, and S. G. Yoon, J. KIEEME, 24, 126 (2011).
8 H. S. Kim, H. W. Jang, J. Y. Kang, J. S. Kim, S. J. Yoon, and C. K. Kim, J. KIEEME, 25, 563 (2012).
9 C. Guillen and J. Herrero, Thin Solid Films, 480, 129 (2005).