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http://dx.doi.org/10.4313/JKEM.2011.24.3.229

Effect of Methane Gases on the Properties of Diamond Thin Films Synthesized by MPCVD  

Song, Jin-Soo (Department of Consulting Management, SBC)
Nam, Tae-Woon (Department of Metallurgical Material Science, Hanyang University)
Publication Information
Journal of the Korean Institute of Electrical and Electronic Material Engineers / v.24, no.3, 2011 , pp. 229-233 More about this Journal
Abstract
Diamond thin films were deposited on pretreated Co cemented tungsten carbide (WC-6%Co) inserts as substrate by microwave plasma chemical vapor deposition (MPCVD) system, equipped with a 915MHz, 30kW generator for generating a large-size plasma. The substrates were pretreated with two solutions Murakami solution $[KOH:K_3Fe(CN)_6:H_2O]$ and nitric solution $[HNO_3:H_2O]$ to etch, WC and Co at cemented carbide substrates, respectively. The deposition experiments were performed at an input power of 10 kW and in a total pressure of 100 torr. The influence of various $CH_4$ contents on the crystallinity and morphology of the diamond films deposited in MPCVD was investigated using scanning electron microscopy (SEM) and Raman spectroscopy. The diamond film synthesized by the $CH_4$ plasma shows a triangle-faceted (111) diamond. As $CH_4$ contents was increased, the thickness of diamond films increased and the faceted planes disappeared. Finally, Faceted diamond changed into nano-crystalline diamond with random crystallinity.
Keywords
Diamond thin film; Deposition; $CH_4$ Gas; MPCVD;
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