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http://dx.doi.org/10.4313/JKEM.2011.24.2.126

Characterization of the Crystallized ITO Thin Films Grown at a Low Temperature by Off-axis RF Magnetron Sputtering  

Choi, Hyung-Jin (School of Nano Science and Technology, Chungnam National University)
Jung, Hyun-June (School of Nano Science and Technology, Chungnam National University)
Hur, Sung-Gi (School of Nano Science and Technology, Chungnam National University)
Yoon, Soon-Gil (School of Nano Science and Technology, Chungnam National University)
Publication Information
Journal of the Korean Institute of Electrical and Electronic Material Engineers / v.24, no.2, 2011 , pp. 126-130 More about this Journal
Abstract
In this study, off-axis magnetron sputtering was used for the crystallized ITO thin films at a low temperature of about $120^{\circ}C$ instead of the conventional RF sputtering because the off-axis sputtering can avoid the damage for the plasma as well as fabrication of thin films with a high quality. The ITO thin films grown on PET substrate at $120^{\circ}C$ were crystallized with a (222) preferred orientation. 58-nm thick ITO films showed a resistivity of about $2{\times}10-4{\Omega}{\cdot}cm$ and a transmittance of about 75% at a wavelength of 550 nm. The transmittance of the ITO thin films by an insertion of SiO2 thin films on ITO films was improved.
Keywords
ITO; TCO; Off-axis sputtering; PET;
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Times Cited By KSCI : 2  (Citation Analysis)
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