Comparative Analysis of Flicker Noise and Reliability of NMOSFETs with Plasma Nitrided Oxide and Thermally Nitrided Oxide |
Lee, Hwan-Hee
(Department of Electronic Engineering, Chungnam University)
Kwon, Hyuk-Min (Department of Electronic Engineering, Chungnam University) Kwon, Sung-Kyu (Department of Electronic Engineering, Chungnam University) Jang, Jae-Hyung (Department of Electronic Engineering, Chungnam University) Kwak, Ho-Young (Department of Electronic Engineering, Chungnam University) Lee, Song-Jae (Department of Electronic Engineering, Chungnam University) Go, Sung-Yong (DMS Co. Ltd.) Lee, Weon-Mook (DMS Co. Ltd.) Lee, Hi-Deok (Department of Electronic Engineering, Chungnam University) |
1 | I. S. Han, H. M. Kwon, J. D. Bok, S. K. Kwon, Y. J. Jung, W. I. Choi, D. S. Choi, M. G. Lim, Y. S. Chung, J. H. Lee, G. W. Lee, and H. D. Lee, Jpn. J. Appl Phys., 50, 10PB03-1 (2011). DOI |
2 | N. Kimizuka, K. Yamaguchi, K. Imai, T. Iizuka, C. T. Liu, R. C. Keller, and T. Horiuchi, Symp. VLSI Tech. Dig., 92 (2000). |
3 | Y. Mitani, M. Nagamine, H. Satake, and A. Toriumi, IEDM Tech. Dig., 509 (2002). |
4 | Y. M. Kim, J. KIEEME, 16, 181 (2003). |
5 | M. F. Li, D. Huang, W. J. Liu, Z. Y. Liu, and X. Y. Huang, Trans. Electrochemical Society, 19, 301 (2009). |
6 | S. G. Lee, J. M. Hwang, and H. D. Lee, IEEE Trans. Elec. Dev., 49, 1876 (2002). DOI |
7 | M. V. Haartman and M. Ostling, Low-Frequency Noise In Advanced MOS Devices (Springer, Netherlands, 2007) p. 66. |
8 | J. S. Chen and M. D. Ker, IEEE Trans. Elec. Dev., 56, 1774 (2009). DOI |
9 | D. W. Lee, D. Blaauw, and D Sylvester, IEEE Trans. Very Large Scale Integ. Syst., 12, 155 (2004). DOI |
10 | H. Watanabe, K. Matsuzawa, and S. Takagi, IEEE Trans. Elec. Dev., 50, 1779 (2003). DOI |
11 | I. S. Han, H. H. Ji, T. G. Goo, O. S. Yoo, W. H. Choi, S. H. Park, H. S. Lee, Y. S. Kang, D. B. Kim, and H. D. Lee, J. KIEEME, 20, 569 (2007). |