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http://dx.doi.org/10.4313/JKEM.2010.23.7.521

A Study of the Dielectric Properties of the Silver-Tantalate-Niobate Thick Films  

Lee, Ku-Tak (Department of Electronic Materials Engineering, Kwangwoon University)
Yun, Seok-Woo (Department of Electronic Materials Engineering, Kwangwoon University)
Kang, Ey-Goo (Department of Photovoltaic Engineering, Far East University)
Koh, Jung-Hyuk (Department of Electronic Materials Engineering, Kwangwoon University)
Publication Information
Journal of the Korean Institute of Electrical and Electronic Material Engineers / v.23, no.7, 2010 , pp. 521-524 More about this Journal
Abstract
Low loss perovskite niobates and tantalates have been placed on a short list of functional materials for future technologies. In this study, we fabricated Ag(Ta,Nb)$O_3$ thick films on the $Al_2O_3$ substrates by the screen printing method. The Ag(Ta,Nb)$O_3$ powders were fabricated by the mixed oxide method. The sintering temperature and time were $1150^{\circ}C$ and 2 hrs, respectively. The results of XRD analysis showed that the specimens employed in this study had the pesudo cubic structure. The dielectric permittivity and loss tangent of the films have been characterized from 1 kHz to 1 MHz. Also the dielectric permittivity and loss tangent were measured from 303 K to 393 K. The electrical properties of the film are also discussed.
Keywords
Ag(Ta,Nb)$O_3$ thick film; XRD; dielectric properties; Electrical properties;
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