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http://dx.doi.org/10.4313/JKEM.2010.23.4.303

Preparation of La0.6Sr0.4MnO3 Thin Films by RF Magnetron Sputtering and Their Microstructure and Electrical Conduction Properties  

Park, Chang-Sun (군산대학교 신소재공학과)
Sun, Ho-Jung (군산대학교 신소재공학과)
Publication Information
Journal of the Korean Institute of Electrical and Electronic Material Engineers / v.23, no.4, 2010 , pp. 303-310 More about this Journal
Abstract
We fabricated $La_{0.6}Sr_{0.4}MnO_3$ thin films using radio frequency (RF) magnetron sputtering. They were grown on sapphire substrates with various deposition conditions. After the growth of the $La_{0.6}Sr_{0.4}MnO_3$ thin films, they were annealed at various temperatures to be crystallized. We successfully fabricated single phase $La_{0.6}Sr_{0.4}MnO_3$ thin films with high electrical conductivity. The room temperature resistivity was $1.5{\times}10^{-2}{\Omega}{\cdot}cm$. It can be considered that $La_{0.6}Sr_{0.4}MnO_3$ thin films are one of the feasible candidates for electrodes for integrated device applications.
Keywords
$La_{0.6}Sr_{0.4}MnO_3$; Thin film; RF magnetron sputtering; Electrode;
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