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http://dx.doi.org/10.4313/JKEM.2010.23.12.966

Preparation of Sr2FeMoO6 Thin Films by RF Magnetron Sputtering and Their Electrical Conduction Properties  

Ryu, Hee-Uk (Department of Materials Science Engineering, Kunsan National University)
Sun, Ho-Jung (Department of Materials Science Engineering, Kunsan National University)
Publication Information
Journal of the Korean Institute of Electrical and Electronic Material Engineers / v.23, no.12, 2010 , pp. 966-972 More about this Journal
Abstract
Single-phase $Sr_2FeMoO_6$ thin films were produced by RF magnetron sputtering for use as electrodes in integrated sensors and found to be good conductors at room temperature. The films were deposited from a powder-type sputtering target under various conditions, and were crystallized by annealing. Elimination of $O_2$ gas during deposition, by the use of a solely Ar sputtering gas under a working pressure as low as possible, and vacuum annealing were important to promote the $Sr_2FeMoO_6$ phase. However, oxygen exclusion from sputtering and annealing was not enough to yield single-phase $Sr_2FeMoO_6$: hydrogen annealing was also required. Film production was optimized by varying the deposition parameters and hydrogen annealing conditions. The film had good electrical conduction, with a low resistivity of $1.6{\times}10^{-2}\Omega{\cdot}cm$ at room temperature.
Keywords
$Sr_2FeMoO_6$; Conductive oxide; Thin film; Electrode; RF sputtering;
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1 T. Nakamura, K. Kunihara, and Y. Hirose, Mat. Res. Bull. 16, 321 (1981).   DOI
2 T. Mihara, H. Watanabe, and C. A. P. D. Araujo, Jpn. J. Appl. Phys. 33, 5281 (1994).   DOI
3 J. J. Lee, C. L. Thio, and S. B. Desu, J. Appl .Phys. 78, 5073 (1995).   DOI
4 D. J. Taylor, J. Geerse, and P. K. Larsen, Thin Solid Films 263, 221 (1995).   DOI
5 D. P. Vijay and S. B. Desu, J. Electrochem. Soc. 140, 2640 (1993).   DOI
6 T. Nakamura, Y. Nakao, A. Kamisawa, and H. Takasu, Appl. Phys. Lett. 65, 1522 (1994).   DOI
7 M.-S. Chen, J.-M. Wu, and T.-B. Wu, Jpn. J. Appl. Phys. 34, 4870 (1995).   DOI
8 T. Morimoto, O. Hidaka, K. Yamakawa, O. Arisumi, H. kanaya, T. Iwamoto, Y. Kumura, I. Kunishima, and S.-I. Tanaka, Jpn. J. Appl. Phys. 39, 2110 (2000).   DOI
9 D. Serrate, J. M. De Teresa, and M. R. Ibarra, J. Phys.: Condens. Matter 19, 023201 (2007).   DOI
10 T. Manako, M. Izumi, Y. Konishi, and K. I. Kobayashi, M. Kawasaki and Y. Tokura, Appl. Phys. Lett. 74, 2215 (1999).   DOI
11 H. Asano, S. B. Orale, J. Garrison, A. Orozoco, Y. H. Li, E. Li, V. Smolyaninova, C. Galley, M. Downes, M. Rajeswari, R. Ramesh, and T. Venkatesan, Appl. Phys. Lett. 74, 3696 (1999).   DOI