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http://dx.doi.org/10.4313/JKEM.2010.23.11.886

Hydrophobic Properties of PTFE Thin Films Deposited on Glass Substrates Using RF-Magnetron Sputtering Method  

Kim, Hwa-Min (Department of Electronics Engineering, Catholic University of Daegu)
Kim, Dong-Young (Department of Electronics Engineering, Catholic University of Daegu)
Publication Information
Journal of the Korean Institute of Electrical and Electronic Material Engineers / v.23, no.11, 2010 , pp. 886-890 More about this Journal
Abstract
The polytetrafluoroethylene (PTFE) films are deposited on glass using conventional rf-magnetron sputtering method. Their hydrophobic properties are investigated for application as an anti-fouling coating layer on the screen of displays. It is found that the hydrophobicity of PTFE films largely depends on the sputtering conditions, such as Ar gas flow and deposition time during sputtering process. These conditions are closely related to the deposition rate or thickness of PTFE film. Thus, it is also found that the deposition rate or the film thickness affects sensitively the geometrical morphology formed on surface of the rf-spluttered PTFE films. In particular, the PTFE film with 1950 nm thickness deposited for 30 minute at rf-power 50 W shows a very excellent optical transmittance of over 90% and a good anti-fouling property and a good durability.
Keywords
RF-magnetron sputtering; PTFE; Hydrophobicity; Water contact angle;
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