Fabrication and Electrical Properties of Al2O3/GaN MIS Structures using Remote Plasma Atomic Layer Deposition
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Yun, Hyeong-Seon
(청주대학교 전자공학과)
Kim, Hyun-Jun (청주대학교 전자공학과) Lee, Woo-Seok (청주대학교 전자공학과) Kwak, No-Won (청주대학교 전자공학과) Kim, Ka-Lam (청주대학교 전자공학과) Kim, Kwang-Ho (청주대학교 전자공학과) |
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