The Preferred Orientation and Morphology Characteristics of AlN Thin Films Prepared by RF Power Under Room Temperature Process |
Oh, Su-Young
(성균관대학교 정보통신공학부)
Kim, Eung-Kwon (성균관대학교 정보통신공학부) Lee, Tae-Yong (성균관대학교 정보통신공학부) Kang, Hyun-Il (성균관대학교 정보통신공학부) Yu, Hyun-Kyu (성균관대학교 정보통신공학부) Song, Joon-Tae (성균관대학교 정보통신공학부) |
1 | H. Cheng and P. Hing, 'The evolution of preferred orientation and morphology of AlN films under various RF sputtering powers', Surface and Coatings Technology, Vol. 167, p. 297, 2003 DOI ScienceOn |
2 | K.-H. Chiu, J.-H. Chen, H.-R. Chen, and R.-S. Huang, 'Deposition and characterization of reactive magnetron sputtered aluminum nitride thin films for film bulk acoustic wave resonator', Thin Solid Films, Vol. 515, p. 4819, 2007 DOI ScienceOn |
3 | S. U. Hong, G. P. Han, M. C. Paek, K. I. Cho, and S.-G. Yoon, 'Effects of Al/N ratio on microstructure of AlN films grown by PAMBE', The Korean Institute of Electrical and Electronic Material Engineers, Vol. 14, No. 12, p. 972, 2001 |
4 | L. Mang, F. Hickernell, R. Pennell, and T. Hickernell, 'Thin-film resonator ladder filter', in IEEE MTT-S Int. Microwave Symp. Dig., Vol. 2, p. 887, 1995 |
5 | A. Saxler, P. Kung, C. J. Sun, E. Bigan, and M. Razeghi, 'High quality aluminum nitride epitaxial layers grown on sapphire substrates', Appl. Phys. Lett., Vol. 64, p. 339, 1994 DOI ScienceOn |
6 | Q.-X. Su, P. Kirby, E. Komuro, M. Imura, Q. Zhang, and R. Whatmore, 'Thin-film bulk acoustic resonators and filters using ZnO and lead-zirconium-titanate thin films', IEEE Trans. Microwave Theory Tech., Vol. 49, No. 4, p. 769, 2001 DOI ScienceOn |
7 | M. A. Auger, L. Vazquez, M. Jergel, O. Sanchez, and J. M. Albella. 'Structure and morphology evolution of ALN films grown by DC sputtering', Surface and Coatings Technology, Vol. 180, p. 140, 2004 DOI ScienceOn |
8 | S. A. Nikishin, N. N. Faleev, and M. Holtz, 'Vibrational properties of AlN grown on (111)-oriented silicon', The American Physical Society, Vol. 63, 2001 |
9 | J. X. Zhanga, H. Chenga, Y. Z. Chena, A. Uddina, S. Yuana, S. J. Gengb, and S. Zhangb, 'Growth of AlN films on Si (100) and Si (111) substrates by reactive magnetron sputtering', Surface & Coatings Technology, Vol. 198, p. 68, 2005 DOI ScienceOn |