Fabrication and Properties of Vanadium Oxide Thin Films for Microbolometer by using Plasma Atomic Layer Deposition Method |
Yun, Hyeong-Seon
(청주대학교 전자공학과)
Jung, Soon-Won (한국전자통신연구원 IT융합.부품연구소) Jeong, Sang-Hyun (청주대학교 전자공학과) Kim, Kwang-Ho (청주대학교 전자공학과) Choi, Chang-Auck (한국전자통신연구원 IT융합.부품연구소) Yu, Byoung-Gon (한국전자통신연구원 IT융합.부품연구소) |
1 | C. Hanson, 'Uncooled thermal imaging at texas instruments', SPIE, Vol. 2020, p. 330, 1993 |
2 | W. Paul, 'Present position of theory and experiment for VO', Mater. Res. Bull., Vol. 5, p. 691, 1970 DOI ScienceOn |
3 | T. Kanno and M. Saga, 'Uncooled infrared focal plane array having thermopile detector elements', SPIE, Vol. 2269, p. 450, 1994 |
4 | F. J. Morin, 'Oxides which show a metal-toinsulator transition at the neel temperature', Phys. Rev. Lett., Vol. 3, p. 34, 1959 DOI |
5 | J. F. De Natale, P. J. Hood, and A. B. Harker, 'Formation and characterization of grain-oriented thin films', J. Appl. Phys., Vol. 66, Iss. 12, p. 5844, 1989 DOI |
6 | A. Mantoux, H. Groult, E. Balnois, P. Doppelt, and L. Gueroudji, 'Vanadium oxide films synthesized by CVD and used as positive electrodes in secondary lithium batteries', J. Electrochem. Soc., Vol. 151, Iss. 3, p. 368, 2004 |
7 | P. Dagur, A. U. Mane, and S. A. Shivashankar, 'Thin films of on glass by atomic layer deposition: microstructure and electrical properties', J. Crystal Growth, Vol. 275, p. 1223, 2005 DOI ScienceOn |
8 | Leskela and M. Ritala, 'Atomic layer deposition (ALD): from precursors to thin film structures', Thin Solid Films, Vol. 409, Iss. 1, p. 138, 2002 DOI ScienceOn |
9 | S. M. George, A. W. Ott, and J. W. Klaus, 'Surface chemistry for atomic layer growth', J. Phys. Chem., Vol. 100, p. 13121, 1996 DOI ScienceOn |
10 | R. L. Puurunen, 'Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process', J. Appl. Phys., Vol. 97, Iss. 12, p. 121301, 2005 DOI ScienceOn |
11 | L. S. Hou, S. W. Lu, and F. X. Gam, 'Variation of the optical properties of gelderived thin films with temperature', Vacuum, Vol. 42, p. 1054, 1991 |
12 | F. C. Case, 'Modifications in the phase transition properties of predeposited films", J. Vac. Sci. Technol. A, Vol. 2, Iss. 4, p. 1509, 1984 DOI ScienceOn |
13 | A. Wood, 'High-performance infrared thermal imaging with monolithic silicon focal planes operating at room temperature', Proc. IEDM Tech. Digest, p. 175, 1993 |
14 | A. Zylbersztejn and N. F. Mott, 'Metalinsulator transition in vanadium dioxide', Phys. Rev. B Condens. Matter, Vol. 11, No. 11, p. 4383, 1975 DOI |
15 | Z. P. Wu, A. Miyashita, I. Nashiyama, and H. Naramoto, 'Heterophase polydomain structure and metal-semiconductor phase transition in vanadium dioxide thin films deposited on (1010) sapphire', Philos. Magn. Lett., Vol. 79, Iss. 10, p. 813, 1999 DOI ScienceOn |