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http://dx.doi.org/10.4313/JKEM.2008.21.12.1096

A Study of Boundary and Surface on SnO2 Thin Films Grown by Different Oxygen Flow Gas  

Oh, Seok-Kyun (한국기초과학지원연구원 광주센터)
Shin, Chul-Wha (조선대학교 의과대학)
Jeong, Jin (조선대학교 물리학과)
Publication Information
Journal of the Korean Institute of Electrical and Electronic Material Engineers / v.21, no.12, 2008 , pp. 1096-1100 More about this Journal
Abstract
This report examines the variations on structural properties of $SnO_2$ thin films deposited by using thermal chemical vapor deposition techniques with different oxygen flow gas. TEM showed some of the interface to be atomically rough. The aspects of the boundary shape and growth behavior agree well with the theory of interface growth. The electron diffraction showed that the roughness was changed as the different oxygen flow gas increased. These measurement results suggested that the number of interface facet and abnormal grain growth were related oxygen flow gas.
Keywords
$SnO_2$; Thin films; Interface; CVD;
Citations & Related Records
Times Cited By KSCI : 3  (Citation Analysis)
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