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http://dx.doi.org/10.4313/JKEM.2005.18.8.714

Gradational Double Annealing Process for Improvement of Thermal Characteristics of NiCr Thin Films  

Kwon, Yong (조선대학교 신소재공학과)
Noh, Whyo-Sup (조선대학교 신소재공학과)
Kim, Nam-Hoon (조선대학교 에너지자원신기술연구소)
Cho, Dong-You (조선대학교 에너지자원신기술연구소)
Park, Jinseong (조선대학교 신소재공학과)
Publication Information
Journal of the Korean Institute of Electrical and Electronic Material Engineers / v.18, no.8, 2005 , pp. 714-719 More about this Journal
Abstract
NiCr thin film was deposited by DC magnetron sputtering on $A;_2O_3$/Si substrate with NiCr (80:20) alloy target. NiCr thin films were annealed at $300^{\circ}C,\;400^{\circ}C,\;500^{\circ}C,\;600^{\circ}C,\;and\;700^{\circ}C$ for 6 hr in $H_2$ after annealing at $500^{\circ}C$ for 6hr in air atmosphere, respectively. To analyze NiCr thin film properties, the changes of its micro structure were Investigated through field emission scanning electron microscope (FESEM). X-ray photoelectron spectroscopy (XPS) was used to analyze a surface of NiCr thin film. Resistance of NiCr thin film was measured by 4-point probe technique. The generated heats were measured by infrared thermometer through the application of DC voltage (5 V/l2 V). NiCr thin film treated by gradational double annealing process had uniform and small grains. Maximum temperature generated heat by NiCr micro heater was $173^{\circ}C$. We expect that our results will be a useful reference in the realization of NiCr micro heater.
Keywords
NiCr thin film; DC magnetron sputter; Micro heater; X-ray photoelectron spectroscopy(XPS);
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