Degradation of Ultra-thin SiO2 film Incorporated with Hydrogen or Deuterium Bonds during Electrical Stress
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Lee, Jae-sung
(위덕대학교 정보통신공학부)
Back, Jong-mu (대원과학대학 전자정보통신과) Jung, Young-chul (경주대학교 컴퓨터멀티미디어공학부) Do, Seung-woo (경북대학교 전자전기공학부) Lee, Yong-hyun (경북대학교 전자전기공학부) |
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