Modified Illumination by Binary Phase Diffractive Patterns on the Backside of a Photomask |
이재철
(원광대학교 전기전자 및 정보공학부)
오용호 (원광대학교 전기전자 및 정보공학) 고춘수 (원광대학교 전기전자 및 정보공학부) |
1 |
A concept for a high resolution optical lithographic system for producing one half micron linewidths
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2 |
KrF excimer laser lithography with a dummy diffraction mask
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과학기술학회마을 |
3 |
High performance lithography with advanced modified illumination
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4 |
Subhalf micron lithography system with phase shifting effect
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5 |
Photographic system using annular illumination
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DOI |