Surface Reactions on the Bi4-xLaxTiO3O12 Thin Films Etched in Inductively Coupled CF4/Ar Plasma |
김동표
(중앙대학교 전자전기공학부)
김경태 (중앙대학교 전자전기공학부) 김창일 (중앙대학교 전자전기공학부) |
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Studies of ion bombardment in higih density plasmas containing CF₄
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DOI |
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Dry etching of <TEX>$SrBi_2Ta_2O_9$</TEX> thin films in <TEX>$CI_2/NF_3/O_2/Ar$</TEX> inductively coupled plasmas
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DOI ScienceOn |
3 |
Effects of BCl₃addition on Ar/Cl₂ gas in inductively coupled plasmas for lead zirconate titanate etching
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DOI ScienceOn |
4 |
Dry etching characteristics of Pb(Zr,Ti)O₃films in CF₄ and CI₂/CF₄ inductively coupled plasmas
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DOI |
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Ar/CF₄유도결합 플라즈마를 이용한 <TEX>$Ba_{0.6}Sr_{0.4})$</TEX> TiO₃박막의 식각 특성
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과학기술학회마을 DOI ScienceOn |
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Lanthanum-substituted bismuth titanate for use in non-volatile memories
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DOI |
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Plasma etch modeling using optical emission spectroscopy
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DOI ScienceOn |
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비휘발성 메모리 소자응용을 위한 과잉 Bi 첨가에 따른 BLT 박막의 강유전 특성
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과학기술학회마을 DOI ScienceOn |
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Reactive ion etching of ferroelectric <TEX>$SrBi_2Ta_xNb_{2-x}O_9$</TEX> thin films
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DOI |
11 |
<TEX>$CI_2/CF_4/Ar$</TEX> 유도결합 플라즈마에 의해 식각된 SBT 박막의 표면 손상
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과학기술학회마을 DOI ScienceOn |
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Why Ianthanum substituted bismuth titanate becomes fatigue free in a ferroelectric capacitor with platinum electrodes
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DOI ScienceOn |
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Effects of ion etching and annealing in O₂atmosphere following ion etching on properties and chemistry of <TEX>$Sr_{0.9}Bi_{2.1}Ta_2O_{9+a}$</TEX> thin films
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DOI |
16 |
Reactive ion etching of Pt/PZT/Pt ferroelectric thin film capacitors in high density DECR plasma
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DOI ScienceOn |
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Analysis of the etching of silicon in an inductively coupled chlorine plasma using laser thermal desorption
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DOI ScienceOn |