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http://dx.doi.org/10.4313/JKEM.2002.15.7.634

Deposition of Carbon Thin Film using Laser Ablation and Its Field Emission Properties  

Kenjiro Oura (Osaka University)
Publication Information
Journal of the Korean Institute of Electrical and Electronic Material Engineers / v.15, no.7, 2002 , pp. 634-639 More about this Journal
Abstract
Using laser ablation technique carbon thin films were deposited on Si(100) substrate as a function of substrate temperature. In this study, the surface morphologic, structural and field emission properties of these carbon thin films were investigated using Raman spectroscopy, scanning electron microscopy, and a diode technique, respectively. With increasing of the substrate temperature, the surface morphologies were changed significantly. Moreover, the intensity of D-band and the full width at half maximum of these bands were dependent on substrate temperatures. As the substrate temperature was increased, the field emission properties were improved. As the result, we find that the field emission properties of the films were changed significantly with the substrate temperature and structural features of carbon than films.
Keywords
Carbon thin film; Laser ablation technique; Scanning electron microscopy; Raman spectroscopy; Field emission;
Citations & Related Records
Times Cited By KSCI : 6  (Citation Analysis)
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