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http://dx.doi.org/10.4313/JKEM.2002.15.6.543

Effect of Mixed Gases on Decomposition Characteristic of CF4 by Non-Thermal Plasma  

박재윤 (경남대학교 전기·전자공학부)
정장근 (경남대학교 전기·전자공학부)
김종석 (경남대학교 전기·전자공학부)
임근희 (한국전기연구원)
Publication Information
Journal of the Korean Institute of Electrical and Electronic Material Engineers / v.15, no.6, 2002 , pp. 543-550 More about this Journal
Abstract
In this paper, the $CF_4$ decomposition rate and by-product were investigated for two simulated plasma reactors which are metal particle reactor and spiral wire reactors as a function of mixed gases. The $CF_4$ decomposition rate by plasma reactor with metal particle electrode had a gain of 20~25% over that by plasma reactor with spiral wire electrode. The $CF_4$ decomposition efficiency increases with increasing applied voltage up to the critical voltage for spark formation. The $CF_4$ decomposition efficiency of metal particle reactor was about 80% at AC 24kV. The $CF_4$ decomposition rate used Ar-$N_2$ as base gas was the highest among three base gases of $N_2$, $Ar-N_2$, air. The by-products of the $N_2$, $N_2Ar$ base as were similar, but in case of air base they were different.
Keywords
$CF_4$; By-product; Plasma; Semiconductor; HFC;
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Times Cited By KSCI : 3  (Citation Analysis)
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