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http://dx.doi.org/10.4313/JKEM.2002.15.4.289

A Study of Boron Profiles by High Energy ion Implantation in Silicon  

정원채 (경기대학교 전자공학과)
Publication Information
Journal of the Korean Institute of Electrical and Electronic Material Engineers / v.15, no.4, 2002 , pp. 289-300 More about this Journal
Abstract
In this study, the experiments are carried out by boron ion implantation at energies ranging from 700keV to 2MeV in silicon. The distribution of boron profiles are measured by SIMS(Cameca 6f). Boron dopants profiles after high temp]erasure annealing are also explained by comparisons of experimental and simulated data. A new electronic stopping model for Monte Carlo simulation of high energy implantation is presented. Also the comparisons of profiles by profiles boron ion implantations are demonstrated and interpreted with theoretical models. Finally range moments of SIMS and SRP profiles are calculated and compared with simulation results.
Keywords
MeV implantation; Annealing(RTA, Furnace); SIMS; SRP; Process simulation;
Citations & Related Records
Times Cited By KSCI : 3  (Citation Analysis)
연도 인용수 순위
1 /
[ James D. Plummer;Michael D. Deal;Peter B. Griffin ] / Silicon VLSI Technoly
2 ICECREM 1996 manual /
[ User'Guide ] / Fraunhofer Institut fur Integrierte Schaltungen(ⅡS-B)
3 /
[ W. Eckstein ] / Computer Simulation of Ion-Solid Interactions
4 /
[ J.F. Ziegler;J.P. Biersack;U. Littmark ] / The Stopping and Range of Ions in Solids
5 A monte carlo computer program for the transport of energetic ions in amorphous targets /
[ J.P. Biersack;L.G. Haggmark ] / Nucl. Inst. Meth.   DOI   ScienceOn
6 /
[ C.Y. Chang;S.M. Sze ] / ULSI Devices
7 Hydrogen Stopping Power and Ranges in all Elements /
[ H.H. Andersen;J.F. Ziegler;J.F. Ziegler(ed.) ] / The Stopping and Ranges of Ions in Matter
8 /
[ D. Widmann;H. Mader;H. Friedrich ] / Technologie Hochintegrierter Schaltungn
9 실리콘에 MeV로 이온주입된 인의결함분포와 profile에 관한 연구 /
[ 정원채 ] / 전기전자재료학회논문지   과학기술학회마을
10 The stopping of ions compounds /
[ J.F. Ziegler;J.M. Manoyan ] / Nucl. Inst. Meth.   DOI   ScienceOn
11 /
[ S.A. Campbell ] / The Science & Engineering of Microelectronic Fabrication(2nd ed.)
12 Ion implantation into non-planar targets: monte carlo simulations and analytical models /
[ H. Ryssel;J. Lorenz;W. Kruger ] / Nucl. Inst. Meth.   DOI   ScienceOn
13 The stopping of energetic light ions in elemental matter /
[ J.F. Ziegler ] / J. Appl. Phys.   DOI   ScienceOn
14 /
[ Hong Xiao ] / Introduction to Semiconductor Manufacturing Technology
15 비정질실리콘에 인의도핑과 이온주입에 따른 농도분포에 대한 연구 /
[ 정원채 ] / 전기전자재료학회논문지   과학기술학회마을
16 JBS 정류기의 PN접합구조에 따른 I-V 특성에 관한 연구 /
[ 안병목;정원채 ] / 전기전자재료학회논문지   과학기술학회마을
17 /
[ J.F. Ziegler ] / SRIM 2000 manual
18 Handbook of Range Distributions for Energetic Ions in all Elements /
[ U. Littmark;J.F. Ziegler;J.F. Ziegler(ed.) ] / The Stopping and Ranges of ions in Matter