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http://dx.doi.org/10.5229/JKES.2006.9.2.059

Preparation and Electrochemical Characterization of SnO2/Ti Electrode by Coating Method  

Kim Han-Joo (Dept. of Industrial Chemical Engineering, Chungbuk Nat'l Univ.)
Son Won-Keun (Research Center of Advanced Material, Chungnam Nat'l Univ.)
Hong Ji-Sook (Chemical Engineering Process Center, KRICT)
Kim Tae-Il (Siontech. Co. Ltd.)
Park Soo-Gil (Dept. of Industrial Chemical Engineering, Chungbuk Nat'l Univ.)
Publication Information
Journal of the Korean Electrochemical Society / v.9, no.2, 2006 , pp. 59-63 More about this Journal
Abstract
The study is coated tin(IV) oxide coated on the titanium substrate electrodes by electrodepositon and dip-coating method and studied about that physical and electrochemical characterization by coating methods. After titanium substrate is etched in HCl, electrodespotion is coated $SnCl_2{\cdot}2H_2O$ in nitrate solution by pulse technique, dip-coating method is also used $SnCl_2{\cdot}2H_2O$ in 1;1V% HCl and coated by dipping and annealing process. tin(IV) oxide coated on titanium substrate electrodes by two coating methods are studied x-ray diffraction (XRD), scanning electron microscopy (SEM) to compare physical characterization of electrode and potential window by cyclic voltammetry (CV) to observe electrochemical characterization.
Keywords
HCl etching; Tin(IV) oxide; Dip-coating; Electrodespotion; Potential window;
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