[KSCI] Korea Science Citation Index Service

http://dx.doi.org/10.5229/JKES.2002.5.1.017

Electrodeposition Characteristics and Magnetic Properties of CoFeNi Thin Film Alloys

Song, Jae-Song (Department of Chemical Engineering KwangWoon University)
Yoon, Do-Young (Department of Chemical Engineering KwangWoon University)
Han, Choon (Department of Chemical Engineering KwangWoon University)
Kim, Dae-Heum (Department of Chemical Engineering KwangWoon University)
Park, Dyuk-Young (Department of Chemical Engineering University of California Los Angeles)
Myung, No-Sang (Department of Chemical Engineering University of California Los Angeles)

Publication Information

Journal of the Korean Electrochemical Society / v.5, no.1, 2002 , pp. 17-20 More about this Journal

Abstract

Various compositions of CoFeNi alloys have been electrodeposited in chloride bath and in sulfate bath, and evaluated for electrodeposition characteristics and magnetic properties. For electrodeposited CoFeNi thin film alloys, the increase of Fe content in the deposits from sulfate bath was considerably faster than those from chloride bath. The current efficiencies in sulfate bath showed observable decrease from $75\%\;to\;50\%$ while those in chloride bath showed no significant decrease. From the low coercivity of 3 Oe in the minimum and the higher squarenesses of the alloys from sulfate bath than those from chloride bath, the alloy at Co, Fe, and Ni contents of $80wt.\%,\;10wt.\%,\;and\;10wt.\%$ can be considered to be the best CoFeNi alloy in this research for the soft magnetic material.

Keywords

CoFeNi alloy; electrodeposition; coercivity; squarenesses; magnetic property;

Citations & Related Records

Reference

1	/ [ E. M. Kakuni;D. H. Mosca;I. Massaro;N. Mattoso;W. H. Schreiner;M. A. B. Gomes;M. P. Gantao ] / J. Electrochem. Soc. DOI
2	/ [ N. V. Myung;K. Nobe ] / J. Electrochem. Soc.
3	/ [ K. Y. Sasaki;J. B. Talbot ] / J. Electrochem. Soc. DOI ScienceOn
4	/ [ E. M. KaKuno;N. Mattoso;W. H. Schreiner;D. H. Mosca;M. P. Cantao ] / J. Electrochem. Soc. DOI
5	Electrochemical Technology in Electronics / [ K. Ohashi;M. Ito;M. Watanabe;L. T. Romankiw(Ed.);T. Osaka(Ed.) ] / The Electrochemical Society Proceeding Series
6	/ [ M. Takai;K. Hayashi;M. Aoyagi;T. Osaka ] / J. Electrochem. Soc. DOI
7	/ [ O. Shinoura;A. Kamijima;Y. Narumiya ] / J. Magn. Soc. Jpn. DOI
8	/ [ N. H. Phan;M. Schwartz;K. Nobe ] / Plat. Surf. Finish.
9	/ [ J. Horkans ] / J. Electrochem. Soc. DOI
10	/ [ T. Yokoshima;M. Kaseda;M. Yamada;T. Nakanishi;T. Monma;T. Osaka ] / IEEE Trans. Magn. DOI ScienceOn
11	/ [ A. Nakamura;M. Takai;K. Hayashi;T. Osaka ] / J. Surf. Finish. Soc. Jpn. DOI ScienceOn
12	/ [ D. Golodnitsky;N. V. Gudin;G. A. Volyanuk ] / J. Electrochem. Soc. DOI ScienceOn
13	/ [ N. Robertson;H. L. Hu;C. Tsang ] / IEEE Trans. Magn. DOI ScienceOn
14	/ [ N. C. Anderson;R. B. Chesnutt ] / U. S. Pat. 4,661,216
15	/ [ T. Osaka;M. Takai;K. Hayashi;K. Ohashi;M. Saito;K. Yamada ] / Nature DOI ScienceOn
16	/ [ J. Horkans ] / J. Electrochem. Soc. DOI
17	/ [ T. M. Harris;J. St. Clair ] / J. Electrochem. Soc. DOI
18	/ [ P. C. Andricacos;N. Robertson ] / IBM J. Res. Develop DOI
19	/ [ L. T. Romankiw;I. M. Croll;M. Hatzkis ] / IEEE Trans. Magn.
20	/ [ A. Brenner ] / Electrodeposition of Alloys, Principle and Practice
21	/ [ D. L. Grimmett;M. Schwartz;K. Nobe ] / Plat. Surf. Finish
22	/ [ T. M. Harris;J. L. (St. Clair) Wilson;M. Bleakley ] / J. Electrochem. Soc. DOI ScienceOn
23	/ [ K. Y. Sasaki;J. B. Talbot ] / J. Electrochem. Soc. DOI
24	/ [ T. Osaka;M. Takai;K. Hayashi;Y. Sogawa;K. Ohashi;Y. Yasue;M. Saito;K. Yamada ] / IEEE Trans. Magn. DOI ScienceOn
25	/ [ E. Barrera;M. P. Pardave;N. Batina;I. Gonzalez ] / J. Electrochem. Soc. DOI ScienceOn
26	/ [ G. S. Frankel;V. Brusic;R. G. Schad;J. W. Chang ] / Corr. Sci. DOI ScienceOn
27	/ [ Y. Omata ] / IEEE Trans. J. Magn. Jpn. DOI ScienceOn