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Removal of Humic Acid Using Titania Film with Oxygen Plasma and Rapid Thermal Annealing  

Jang, Jun-Won (Department of Civil Engineering, Hanyang University)
Park, Jae-Woo (Department of Civil Engineering, Hanyang University)
Publication Information
Journal of Soil and Groundwater Environment / v.12, no.3, 2007 , pp. 29-35 More about this Journal
Abstract
Titanium was oxidized with oxygen plasma and calcinated with rapid thermal annealing for degradation of humic acid dissolved in water. Titania photocatalytic plate was produced by titanium surface oxidized with oxygen plasma by Plasma Enhanced Chemical Vapor Deposition (PECVD). RF-power and deposition condition is controlled under 100 W, 150 W, 300 W and 500 W. Treatment time was controlled by 5 min and 10 min. The film properties were evaluated by the X-ray Photoelectron Spectroscopy (XPS) and X-Ray Diffraction (XRD). From the experimental results, we found the optimal condition of titania film which exhibited good performance. Moreover photocatalytic capacity was about twice better than thermal spray titania film, and also as good as titania powder.
Keywords
Titania; Photocatalyst; Plasma oxidation; Rapid thermal annealing;
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