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http://dx.doi.org/10.7471/ikeee.2018.22.1.213

Photothermal characteristics of amorphous carbon thin films  

Oh, Hyungon (Dept of Electrical Engineering, Korea University)
Cho, Kyoungah (Dept of Electrical Engineering, Korea University)
Kim, Sangsig (Dept of Electrical Engineering, Korea University)
Publication Information
Journal of IKEEE / v.22, no.1, 2018 , pp. 213-215 More about this Journal
Abstract
In this study, we fabricate amorphous carbon thin films on silicon substrates by DC sputtering method and investigate the optical property and photothermal characteristics. A representative amorphous carbon thin film has a absorption value of 97% at a wavelength of 1000 nm and shows a temperature increase of $3^{\circ}C$ from $21.1^{\circ}C$ to $24.1^{\circ}C$ during white light irradiation. In addition, the amorphous carbon film has a heating rate four times higher than that of the substrate during light irradiation for 50 sec.
Keywords
solar thermal energy; amorphous carbon; photothermal; Infrared absorption; sputtering method;
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