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http://dx.doi.org/10.7471/ikeee.2016.20.4.392

A Study of Characteristic based on Working Pressure of ITO Electrode for Display  

Kim, Hae-Mun (Dept. of Materials & Energy Engineering College of IT & Energy, KyungWoon University)
Park, Hyung-Jun (Dept. of Materials & Energy Engineering College of IT & Energy, KyungWoon University)
Publication Information
Journal of IKEEE / v.20, no.4, 2016 , pp. 392-397 More about this Journal
Abstract
In this paper, Characteristics of the ITO thin film deposited were analyzed using DC magnetron sputtering in order to investigate the deposition conditions of ITO thin film for transparent electrode. The experiment conditions were atmospheric pressure from 1 to 3[mTorr] with 1 [mTorr] step, bias electric voltage ranged from 260[V] to 330[V] with 10[V] step. The transmittance, refractive index and surface and cross-sectional shape of the deposited thin film were measured with an UV.-VIS. spectrophotometer, ellipsometer and SEM. Such condition as 1~2[mTorr] and near 300[V] voltage the transmittance was over 90[%] and the refractive index more than 2. Therefore, it was confirmed that the appropriate condition for making a highly transparent conductive electrode.
Keywords
DC magnetron; ITO(Indium Tin Oxide); Sputtering; Plasma; PVD(Physical Vapor Deposition);
Citations & Related Records
Times Cited By KSCI : 6  (Citation Analysis)
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