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http://dx.doi.org/10.5012/jkcs.2013.57.1.159

Particle Size Analysis of Chemical Mechanical Polishing (CMP) Powder Using Sedimentation Field-Flow Fractionation (SdFFF)  

Kim, Sol (Department of Chemistry, Hannam University)
Kim, Sun Tae (Department of Chemistry, Hannam University)
Kang, Dong Young (Yonsei University center for research facilities, Yonsei University)
Lee, Seungho (Department of Chemistry, Hannam University)
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Keywords
Chemical Mechanical Polishing (CMP); Size distribution; Sedimentation field-flow fractionation (SdFFF); Transmission Electron Microscopy (TEM); Dynamic Light Scattering (DLS);
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