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http://dx.doi.org/10.5012/jkcs.2004.48.6.663

Time-Dependent Cyclic Modulation Process of CH4 Gas Flow Rate in CH4-H2-O2 Plasma for the Enhancement of Diamond Film Characteristics  

Kim, Sung-Hoon (Department of Nano Materials Chemistry & Engineering, Silla University)
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Keywords
Diamond Films; Time-Dependent Modulation of $CH_4$ Flow Rate; Oxygen Incorporation; Microwave Plasma-Enhanced Chemical Vapor Deposition;
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