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http://dx.doi.org/10.5012/bkcs.2011.32.3.783

Volatile Nickel Aminoalkoxide Complexes as Liquid Precursors for Non-volatile Memory Device of NiO Films by ALD  

Chung, Taek-Mo (Advanced Materials Division, Korea Research Institute of Chemical Technology)
Lee, Sun-Sook (Advanced Materials Division, Korea Research Institute of Chemical Technology)
Cho, Won-Tae (Advanced Materials Division, Korea Research Institute of Chemical Technology)
Kim, Min-Chan (Advanced Materials Division, Korea Research Institute of Chemical Technology)
Lee, Young-Kuk (Advanced Materials Division, Korea Research Institute of Chemical Technology)
Hwang, Jin-Ha (Department of Materials Engineering, Hongik University)
An, Ki-Seok (Advanced Materials Division, Korea Research Institute of Chemical Technology)
Kim, Chang-Gyoun (Advanced Materials Division, Korea Research Institute of Chemical Technology)
Publication Information
Bulletin of the Korean Chemical Society / v.32, no.3, 2011 , pp. 783-784 More about this Journal
Keywords
Nickel oxide; Precursor; ReRAM; ALD; Aminoalkoxide;
Citations & Related Records
Times Cited By KSCI : 1  (Citation Analysis)
Times Cited By Web Of Science : 3  (Related Records In Web of Science)
Times Cited By SCOPUS : 3
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