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http://dx.doi.org/10.5012/bkcs.2010.31.7.1973

Directionality of ο-Phthalaldehyde adsorbed onto H-passivated Si(100) Surface Characterized by NEXAFS and HRPES  

Kim, Ki-Jeong (Pohang Accelerator Laboratory, POSTECH)
Yang, Sena (Department of Chemistry, Sookmyung Women's University)
Kang, Tai-Hee (Pohang Accelerator Laboratory, POSTECH)
Kim, Bong-Soo (Pohang Accelerator Laboratory, POSTECH)
Lee, Hang-Gil (Department of Chemistry, Sookmyung Women's University)
Publication Information
Abstract
The electronic and adsorption structure of o-phthalaldehyde (OPA) on the H-Si(100) surface was investigated by using Near Edge X-ray Fine Structure (NEXAFS) and high resolution photoemission spectroscopy (HRPES). We confirmed that the OPA grown on the H-Si(100) surface showed good dependency with about 60 degree tilting angle using NEXAFS and a single O 1s peak by using HRPES. Hydrogen atom passivated on the Si(100) surface was found to be a seed for making one dimensional organic line that uses a chain reaction as the H-Si(100) surface was compared with the hydrogen free Si(100) surface.
Keywords
o-Phthalaldehyde; H-Si(100); HRPES; NEXAFS; 1-D Organic molecular line;
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