Browse > Article
http://dx.doi.org/10.5012/bkcs.2003.24.5.645

Preparation of Phase-Pure InSe Thin Films by MOCVD Using a New Single-Source Precursor [(Me)₂In(μ-SeMe)]₂  

Cho, Jung-Young (Department of Chemistry, Chung-Ang University)
Jeong, Han-Cheol (Department of Chemistry, Chung-Ang University)
Kim, Kyung-Soo (Department of Chemistry, Chung-Ang University)
Kang, Dong-Hee (Department of Chemistry, Chung-Ang University)
Kim, Hong-Ki (Department of Chemistry, Chung-Ang University)
Shim, Il-Wun (Department of Chemistry, Chung-Ang University)
Publication Information
Keywords
Phase-pure InSe thin film; MOCVD; Organometallic precursor;
Citations & Related Records

Times Cited By Web Of Science : 10  (Related Records In Web of Science)
Times Cited By SCOPUS : 10
연도 인용수 순위
1 Emziane, M.; Marsillac, S.; Bernede, J. C. Materials Chem. and Phys. 2000, 62, 84.   DOI   ScienceOn
2 Massaccesi, S.; Sanchez, S.; Vedel, J. J. of ElectroanalyticalChem. 1996, 412, 95.   DOI   ScienceOn
3 Igasaki, Y.; Fujiwara, T. J. of Crystal Growth 1996, 158, 268.   DOI   ScienceOn
4 Guesdon, J. P.; Kobbi, B.; Julien, C.; Balkanski, M. Phys. Stat.Solidi 1987, A 102, 327.
5 Stoll, S. L.; Barron, A. R. Chem. Mater. 1998, 10, 650.   DOI   ScienceOn
6 Barron, A. R. Adv. Mater. Opt. Electron. 1995, 5, 245.   DOI
7 Parlak, M.; Ercelebi, C . Thin Solid Films 1998, 322, 334.   DOI   ScienceOn
8 Pouchet, C. J. The Aldrich Library of FT-IR Vapor Phase, 1st ed;Aldrich Chemical Company Inc.: Milwaukee, Wisconsin, U.S.A.,1983.
9 McCanny, J. V.; Murray, R. B. J. Phys. L. 1979, 10, 1211.
10 Kumar, R.; Dick, D. G.; Ghazi, S. U.; Taghiof, M.; Heeg, M. J.;Oliver, J. P. Organometallics 1995, 14, 1601.   DOI   ScienceOn